Controlling surface adatom kinetics for improved structural and optical properties of high indium content aluminum indium nitride

2020 ◽  
Vol 127 (12) ◽  
pp. 125301 ◽  
Author(s):  
Zachary Engel ◽  
Evan A. Clinton ◽  
Christopher M. Matthews ◽  
W. Alan Doolittle
2004 ◽  
Author(s):  
Phillip A. Anderson ◽  
Tse-En Daniel Lee ◽  
Chito E. Kendrick ◽  
Wolfgang Diehl ◽  
Robert J. Kinsey ◽  
...  

2001 ◽  
Vol 230 (3-4) ◽  
pp. 448-453 ◽  
Author(s):  
S. Pereira ◽  
M.R. Correia ◽  
T. Monteiro ◽  
E. Pereira ◽  
M.R. Soares ◽  
...  

2018 ◽  
Vol 735 ◽  
pp. 1239-1244 ◽  
Author(s):  
Jianxun Liu ◽  
Hongwei Liang ◽  
Xiaochuan Xia ◽  
Qasim Abbas ◽  
Yang Liu ◽  
...  

Author(s):  
Suwit Kiravittaya ◽  
Kamonchanok Khoklang ◽  
Supachok Thainoi ◽  
Somsak Panyakeow ◽  
Somchai Ratanathammaphan

GaSb quantum dots (QDs) have been grown by solid-source molecular beam epitaxy on a 4-monolayer (ML) InxGa1-xAs (x = 0.07, 0.15, 0.20, and 0.25) to investigate the effects of In-mole-fraction of InGaAs insertion layers on the structural and optical properties of the GaSb QDs. The density of grown GaSb QDs is approximately 1.2-2.8109 cm−2 on In-GaAs insertion layers which depends on the In-molefraction. Dot shape and size change substantially when In-mole-fraction of InGaAs insertion layers is varied. The uniformity of GaSb QDs improves when the indium content increases. The change in freestanding QD morphology is likely due to the modified strain at different values of indium compositions in InGaAs insertion layers. The effects of In-molefraction of InGaAs insertion layer on optical properties of the QDs are studied by photoluminescence (PL). PL results show the blueshift of the emission when the indium content in InGaAs insertion layer increases.


2018 ◽  
Vol 23 (3) ◽  
pp. 230-239
Author(s):  
E.P. Zaretskaya ◽  
◽  
V.F. Gremenok ◽  
A.V. Stanchik ◽  
A.N. Pyatlitski ◽  
...  

2016 ◽  
Vol 12 (3) ◽  
pp. 4394-4399
Author(s):  
Sura Ali Noaman ◽  
Rashid Owaid Kadhim ◽  
Saleem Azara Hussain

Tin Oxide and Indium doped Tin Oxide (SnO2:In) thin films were deposited on glass and Silicon  substrates  by  thermal evaporation technique.  X-ray diffraction pattern of  pure SnO2 and SnO2:In thin films annealed at 650oC and the results showed  that the structure have tetragonal phase with preferred orientation in (110) plane. AFM studies showed an inhibition of grain growth with increase in indium concentration. SEM studies of pure  SnO2 and  Indium doped tin oxide (SnO2:In) ) thin films showed that the films with regular distribution of particles and they have spherical shape.  Optical properties such as  Transmission , optical band-gap have been measured and calculated.


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