50−nm silicon structures fabricated with trilevel electron beam resist and reactive‐ion etching

Applied Physics Letters ◽

10.1063/1.92668 ◽

1981 ◽

Vol 39 (3) ◽

pp. 268-270 ◽

Author(s):

L. D. Jackel ◽

R. E. Howard ◽

E. L. Hu ◽

D. M. Tennant ◽

P. Grabbe

Keyword(s):

Electron Beam ◽

Reactive Ion Etching ◽

Ion Etching ◽

Silicon Structures

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X-ray zone plates fabricated using electron beam lithography and reactive ion etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.583242 ◽

1985 ◽

Vol 3 (1) ◽

pp. 265 ◽

Author(s):

H. Aritome

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Reactive Ion Etching ◽

Ion Etching ◽

X Ray ◽

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Effect of process parameters on the surface morphology and mechanical performance of silicon structures after deep reactive ion etching (DRIE)

Journal of Microelectromechanical Systems ◽

10.1109/jmems.2002.1007405 ◽

2002 ◽

Vol 11 (3) ◽

pp. 264-275 ◽

Author(s):

Kuo-Shen Chen ◽

A.A. Ayon ◽

Xin Zhang ◽

S.M. Spearing

Keyword(s):

Surface Morphology ◽

Process Parameters ◽

Mechanical Performance ◽

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Silicon Structures

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Fabrication of micro-array of Fresnel rings on Si by electron beam lithography and reactive ion etching

Applied Physics A ◽

10.1007/s00339-016-9649-y ◽

2016 ◽

Vol 122 (2) ◽

Author(s):

Nura Liman Chiromawa ◽

Kamarulazizi Ibrahim

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Reactive Ion Etching ◽

Ion Etching ◽

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Ultramicro fabrications on Fe-Ni alloy films using electron-beam writing and reactive-ion etching (abstract)

Journal of Applied Physics ◽

10.1063/1.361575 ◽

1996 ◽

Vol 79 (8) ◽

pp. 5067

Author(s):

I. Nakatani

Keyword(s):

Electron Beam ◽

Reactive Ion Etching ◽

Ion Etching ◽

Alloy Films ◽

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Fabrication of silicon nanopillar arrays by electron beam lithography and reactive ion etching for advanced bacterial adhesion studies

Materials Research Express ◽

10.1088/2053-1591/ab0a16 ◽

2019 ◽

Vol 6 (6) ◽

pp. 065402 ◽

Author(s):

P W Doll ◽

A Al-Ahmad ◽

A Bacher ◽

A Muslija ◽

R Thelen ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Bacterial Adhesion ◽

Reactive Ion Etching ◽

Ion Etching ◽

Nanopillar Arrays

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Visible luminescence from one‐ and two‐dimensional silicon structures produced by conventional lithographic and reactive ion etching techniques

Applied Physics Letters ◽

10.1063/1.113830 ◽

1995 ◽

Vol 66 (9) ◽

pp. 1114-1116 ◽

Author(s):

A. G. Nassiopoulos ◽

S. Grigoropoulos ◽

E. Gogolides ◽

D. Papadimitriou

Keyword(s):

Reactive Ion Etching ◽

Two Dimensional ◽

Ion Etching ◽

Visible Luminescence ◽

Silicon Structures

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A method to evade silicon backside damage in deep reactive ion etching for anodically bonded glass–silicon structures

Sensors and Actuators A Physical ◽

10.1016/s0924-4247(00)00547-1 ◽

2001 ◽

Vol 89 (1-2) ◽

pp. 71-75 ◽

Author(s):

T Matsuura ◽

M Chabloz ◽

J Jiao ◽

Y Yoshida ◽

K Tsutsumi

Keyword(s):

Reactive Ion Etching ◽

Ion Etching ◽

Deep Reactive Ion Etching ◽

Silicon Structures

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High resolution patterning with Ag2S/As2S3 inorganic electron-beam resist and reactive ion etching

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.582755 ◽

1983 ◽

Vol 1 (4) ◽

pp. 1174 ◽

Author(s):

B. Singh

Keyword(s):

Electron Beam ◽

High Resolution ◽

Reactive Ion Etching ◽

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Increased pattern transfer fidelity of ZEP 520A during reactive ion etching through chemical modifications by additional dosing of the electron beam resist

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ◽

10.1116/1.3562272 ◽

2011 ◽

Vol 29 (2) ◽

pp. 021601 ◽

Author(s):

David A. Czaplewski ◽

Leonidas E. Ocola

Keyword(s):

Electron Beam ◽

Reactive Ion Etching ◽

Pattern Transfer ◽

Chemical Modifications ◽

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Nanosilicon dot arrays with a bit pitch and a track pitch of 25nm formed by electron-beam drawing and reactive ion etching for 1Tbit∕in.2 storage

Applied Physics Letters ◽

10.1063/1.2400102 ◽

2006 ◽

Vol 89 (22) ◽

pp. 223131 ◽

Author(s):

Sumio Hosaka ◽

Hirotaka Sano ◽

Masumi Shirai ◽

Hayato Sone

Keyword(s):

Electron Beam ◽

Reactive Ion Etching ◽

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