Three-step deposition process for improved nucleation of noble metal thin films

Scilight ◽  
2020 ◽  
Vol 2020 (38) ◽  
pp. 381103
Author(s):  
Mara Johnson-Groh
2017 ◽  
Vol 631 ◽  
pp. 147-151 ◽  
Author(s):  
Geun-Hyuk Lee ◽  
Sehoon An ◽  
Seong Woo Jang ◽  
Sehoon Hwang ◽  
Sang Ho Lim ◽  
...  

2020 ◽  
Vol 5 (3) ◽  
pp. 52
Author(s):  
Suresh C. Sharma ◽  
Vivek Khichar ◽  
Hussein Akafzade ◽  
Douglas Zinn ◽  
Nader Hozhabri

We have conducted in situ measurements of the surface plasmons and electrical resistivity of noble metal thin films. We present results for the electrical resistivity of these materials as functions of the angle of incidence for p-polarized light of wavelength λ = 632 nm in the Kretschmann configuration optical system. We observe a significantly lower resistivity (higher conductivity) under resonance conditions for the surface plasmon polaritons. The resistivity data are supported by COMSOL simulations of the evanescent fields associated with the surface plasmons. We discuss the resistivity data in terms of the theoretical models, which suggest that the electrical conductivity of the transition metals is sensitive to Umklapp electron-electron scattering and attractive interactions between free electrons because of the screening of the d-band electrons by the s-band electrons.


2016 ◽  
Vol 100 ◽  
pp. 1151-1158
Author(s):  
K.M. Mohibul Kabir ◽  
Ahmad Esmaielzadeh Kandjani ◽  
Christopher J. Harrison ◽  
Samuel J. Ippolito ◽  
Ylias M. Sabri ◽  
...  

2018 ◽  
Vol 8 (7) ◽  
pp. 1733 ◽  
Author(s):  
Jes Linnet ◽  
Anders Runge Walther ◽  
Christian Wolff ◽  
Ole Albrektsen ◽  
N. Asger Mortensen ◽  
...  

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