HTXRD study of atomic layer deposited noble metal thin films heat treated in oxygen

2015 ◽  
Author(s):  
M. J. Heikkilä ◽  
J. Hämäläinen ◽  
M. Ritala ◽  
M. Leskelä
Keyword(s):  
Thin Films ◽  
Noble Metal ◽  
Atomic Layer ◽  
Metal Thin Films ◽  
Heat Treated

Fabrication of nanoporous noble metal thin films by O 2 plasma dealloying

2017 ◽  
Vol 631 ◽  
pp. 147-151 ◽  
Author(s):  
Geun-Hyuk Lee ◽  
Sehoon An ◽  
Seong Woo Jang ◽  
Sehoon Hwang ◽  
Sang Ho Lim ◽  
...  
Keyword(s):  
Thin Films ◽  
Noble Metal ◽  
Metal Thin Films

Thermal atomic layer deposition of rhenium nitride and rhenium metal thin films using methyltrioxorhenium

2021 ◽  
Author(s):  
Stefan Cwik ◽  
Keenan N. Woods ◽  
S. Sameera Perera ◽  
Mark J. Saly ◽  
Thomas J. Knisley ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Thin Films ◽  
Layer Deposition

The growth of rhenium nitride and rhenium metal thin films is presented using atomic layer deposition (ALD) with the precursors methyltrioxorhenium and 1,1-dimethylhydrazine. Saturative, self-limiting growth was determined at 340...

scholarly journals Controlling Electrical Conduction through Noble Metal Thin Films by Surface Plasmon Resonance

2020 ◽  
Vol 5 (3) ◽  
pp. 52
Author(s):  
Suresh C. Sharma ◽  
Vivek Khichar ◽  
Hussein Akafzade ◽  
Douglas Zinn ◽  
Nader Hozhabri
Keyword(s):  
Thin Films ◽  
Electrical Resistivity ◽  
Surface Plasmons ◽  
Noble Metal ◽  
Surface Plasmon ◽  
Polarized Light ◽  
Theoretical Models ◽  
Angle Of Incidence ◽  
Metal Thin Films ◽  
Resistivity Data

We have conducted in situ measurements of the surface plasmons and electrical resistivity of noble metal thin films. We present results for the electrical resistivity of these materials as functions of the angle of incidence for p-polarized light of wavelength λ = 632 nm in the Kretschmann configuration optical system. We observe a significantly lower resistivity (higher conductivity) under resonance conditions for the surface plasmon polaritons. The resistivity data are supported by COMSOL simulations of the evanescent fields associated with the surface plasmons. We discuss the resistivity data in terms of the theoretical models, which suggest that the electrical conductivity of the transition metals is sensitive to Umklapp electron-electron scattering and attractive interactions between free electrons because of the screening of the d-band electrons by the s-band electrons.

Growth of Noble Metal Ru Thin Films by Liquid Injection Atomic Layer Deposition

2009 ◽  
Vol 113 (26) ◽  
pp. 11329-11335 ◽  
Author(s):  
Seong Keun Kim ◽  
Susanne Hoffmann-Eifert ◽  
Rainer Waser
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Noble Metal ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Liquid Injection

Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films

2018 ◽  
Vol 10 (16) ◽  
pp. 14200-14208 ◽  
Author(s):  
Marissa M. Kerrigan ◽  
Joseph P. Klesko ◽  
Kyle J. Blakeney ◽  
Charles H. Winter
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Nickel Metal ◽  
Metal Thin Films ◽  
Layer Deposition

A real-time comparison of mercury accumulation on noble metal thin films using gravimetric device

2016 ◽  
Vol 100 ◽  
pp. 1151-1158
Author(s):  
K.M. Mohibul Kabir ◽  
Ahmad Esmaielzadeh Kandjani ◽  
Christopher J. Harrison ◽  
Samuel J. Ippolito ◽  
Ylias M. Sabri ◽  
...  
Keyword(s):  
Thin Films ◽  
Real Time ◽  
Noble Metal ◽  
Mercury Accumulation ◽  
Metal Thin Films

scholarly journals Thermal atomic layer deposition of ruthenium metal thin films using nonoxidative coreactants

2020 ◽  
Vol 38 (1) ◽  
pp. 012402
Author(s):  
Stefan Cwik ◽  
Keenan N. Woods ◽  
Mark J. Saly ◽  
Thomas J. Knisley ◽  
Charles H. Winter
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Metal Thin Films ◽  
Layer Deposition
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