Characteristics of the transient signal from pulsed glow discharge plasma for atomic emission analysis

2019 ◽  
Vol 55 (1) ◽  
pp. 76-86 ◽  
Author(s):  
Kazuaki Wagatsuma
Keyword(s):  
Glow Discharge ◽  
Discharge Plasma ◽  
Atomic Emission ◽  
Transient Signal ◽  
Glow Discharge Plasma ◽  
Emission Analysis ◽  
Atomic Emission Analysis ◽  
Pulsed Glow Discharge

Deposition of Diamond-Like Carbon Films using Plasma Based Ion Implantation with Bipolar Pulses

2000 ◽  
Vol 647 ◽  
Author(s):  
S. Miyagawa ◽  
Y. Miyagawa
Keyword(s):  
Glow Discharge ◽  
Ion Implantation ◽  
High Voltage ◽  
Voltage Pulse ◽  
Discharge Plasma ◽  
Three Dimensional ◽  
High Voltage Pulse ◽  
Glow Discharge Plasma ◽  
Diamond Like Carbon ◽  
Pulsed Glow Discharge

AbstractPlasma based ion implantation (PBII) with bipolar high voltage pulses has been proposed to improve a dose uniformity in an ion implantation on a three-dimensional target. A pulsed glow discharge plasma is produced around the target by a positive high-voltage pulse, and then ions are implanted into the target from all sides by the subsequent negative high-voltage pulse. A time resolved plasma density and the spatial profiles of the pulsed glow discharge plasma are measured by a Langmuir probe in a boxcar mode, and diamond like carbon (DLC) films are deposited under optimal conditions of the pulsed plasma. It is shown that the PBII with bipolar pulses is a useful method in depositing DLC films on the three-dimensional target. A carbon ion implantation procedure results in the enhanced adherence of DLC coating to the target, and the enhanced adhesion is due to a graded carbon interface produced by carbon implantation.

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