Influence of CH4 Flow Rate on Microstructure and Properties of Ti-C:H Films Deposited by DC Reactive Magnetron Sputtering
2016 ◽
Vol 60
(5)
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pp. 852-860
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2016 ◽
Vol 675-676
◽
pp. 217-220
2005 ◽
Vol 38
(22)
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pp. 4104-4108
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2004 ◽
Vol 182
(2-3)
◽
pp. 192-198
◽
2014 ◽
Vol 979
◽
pp. 448-451
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Structure and Electrical Property of CuInS2 Thin Films Deposited by DC Reactive Magnetron Sputtering
2011 ◽
Vol 26
(12)
◽
pp. 1287-1292
◽
2011 ◽
Vol 21
(4)
◽
pp. 770-776
◽
2012 ◽
Vol 30
(3)
◽
pp. 031503
◽
2010 ◽
Vol 45
(18)
◽
pp. 4994-5001
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