CHARACTERIZATIONS OF GALLIUM AND ARSENIC CO-DOPED ZnO THIN FILMS DEPOSITED BY PULSED LASER DEPOSITION TECHNIQUE

2007 ◽  
Vol 90 (1) ◽  
pp. 30-41
Author(s):  
F. K. SHAN ◽  
G. X. LIU ◽  
W. J. LEE ◽  
S. C. KIM ◽  
B. C. SHIN
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Thin Films ◽  
Deposition Technique ◽  
Doped Zno ◽  
Co Doped

Magnetic and Raman scattering studies of Co-doped ZnO thin films grown by pulsed laser deposition

2013 ◽  
Vol 115 (3) ◽  
pp. 843-849 ◽  
Author(s):  
Arun Aravind ◽  
K. Hasna ◽  
M. K. Jayaraj ◽  
Mukesh Kumar ◽  
Ramesh Chandra
Keyword(s):  
Thin Films ◽  
Raman Scattering ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Thin Films ◽  
Doped Zno ◽  
Co Doped

Properties of InAs co-doped ZnO thin films prepared by pulsed laser deposition

2009 ◽  
Vol 44 (12) ◽  
pp. 1319-1322 ◽  
Author(s):  
J. Elanchezhiyan ◽  
B. C. Shin ◽  
W. J. Lee ◽  
S. H. Park ◽  
S. C. Kim
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Thin Films ◽  
Doped Zno ◽  
Co Doped

Gallium and Nitrogen Co-Doped ZnO Thin Films by Pulsed Laser Deposition

2008 ◽  
Vol 368-372 ◽  
pp. 322-325
Author(s):  
G.X. Liu ◽  
F.K. Shan ◽  
Byoung Chul Shin ◽  
Won Jae Lee
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Thin Films ◽  
X Ray ◽  
Atomic Force ◽  
Different Temperatures ◽  
Doped Zno ◽  
Co Doped

Pulsed laser deposition (PLD) technique is a very powerful method for fabricating various oxide thin films due to its native merits. In this study, gallium and nitrogen co-doped ZnO thin films (0.1 at.%) were deposited at different temperatures (100-600°C) on sapphire (001) substrates by using PLD. X-ray diffractometer, atomic force microscope, spectrophotometer, and spectrometer were used to characterize the structural, the morphological and the optical properties of the thin films. Hall measurements were also carried out to identify the electrical properties of the thin films.

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