Indium tin oxide films prepared by atmospheric plasma annealing and their semiconductor–metal conductivity transition around room temperature

2009 ◽  
Vol 42 (10) ◽  
pp. 105303 ◽  
Author(s):  
Yali Li ◽  
Chunyang Li ◽  
Deyan He ◽  
Junshuai Li
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Oxide Films ◽  
Atmospheric Plasma ◽  
Tin Oxide Films ◽  
Plasma Annealing ◽  
Metal Conductivity

Pulsed Laser Deposition of Crystalline Indium Tin Oxide Films at Room Temperature by Substrate Laser Irradiation

2000 ◽  
Vol 39 (Part 2, No. 4B) ◽  
pp. L377-L379 ◽  
Author(s):  
Frederick O. Adurodija ◽  
Hirokazu Izumi ◽  
Tsuguo Ishihara ◽  
Hideki Yoshioka ◽  
Muneyuki Motoyama ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Laser Irradiation ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Oxide Films ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Tin Oxide Films

Amorphous indium tin oxide films deposited on flexible substrates by facing target sputtering at room temperature

2014 ◽  
Vol 556 ◽  
pp. 155-159 ◽  
Author(s):  
Yu Xiao ◽  
Fangyuan Gao ◽  
Guobo Dong ◽  
Tingting Guo ◽  
Qirong Liu ◽  
...  
Keyword(s):  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Room Temperature ◽  
Oxide Films ◽  
Flexible Substrates ◽  
Facing Target Sputtering ◽  
Tin Oxide Films
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