Highly doped p-type microcrystalline silicon thin films fabricated by a low-frequency inductively coupled plasma at a low temperature

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/44/34/345401 ◽

2011 ◽

Vol 44 (34) ◽

pp. 345401 ◽

Author(s):

W S Yan ◽

D Y Wei ◽

S Xu ◽

C C Sern ◽

H P Zhou

Keyword(s):

Low Temperature ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

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Highly doped p-type nanocrystalline silicon thin films fabricated by low-frequency inductively coupled plasma without H2 dilution

Journal of Applied Physics ◽

10.1063/1.3642983 ◽

2011 ◽

Vol 110 (6) ◽

pp. 063302 ◽

Author(s):

W. S. Yan ◽

D. Y. Wei ◽

S. Xu ◽

H. P. Zhou

Keyword(s):

Inductively Coupled Plasma ◽

Low Frequency ◽

Nanocrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

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Effect of silane/hydrogen ratio on microcrystalline silicon thin films by remote inductively coupled plasma

Journal of Applied Physics ◽

10.1063/1.4807404 ◽

2013 ◽

Vol 113 (20) ◽

pp. 203505 ◽

Author(s):

Y. N. Guo ◽

D. Y. Wei ◽

S. Q. Xiao ◽

S. Y. Huang ◽

H. P. Zhou ◽

...

Keyword(s):

Inductively Coupled Plasma ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films

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Nano-crystalline silicon thin films grown by the inductively coupled plasma assisted CFUBM at low temperature

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2010.07.086 ◽

2010 ◽

Vol 205 ◽

pp. S227-S230 ◽

Author(s):

Kyung S. Shin ◽

Yoon S. Choi ◽

In S. Choi ◽

Y. Setsuhara ◽

Jeon G. Han

Keyword(s):

Low Temperature ◽

Inductively Coupled Plasma ◽

Crystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Nano Crystalline

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Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films

Japanese Journal of Applied Physics ◽

10.7567/jjap.52.11nb05 ◽

2013 ◽

Vol 52 (11S) ◽

pp. 11NB05 ◽

Author(s):

Kosuke Takenaka ◽

Yuichi Setsuhara ◽

Akinori Ebe

Keyword(s):

Magnetron Sputtering ◽

Inductively Coupled Plasma ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Microcrystalline Silicon ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Controlled Deposition

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Enhanced Nucleation of Microcrystalline Silicon Thin Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition with Low-Frequency Pulse Substrate Bias

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.050202 ◽

2010 ◽

Vol 49 (5) ◽

pp. 050202

Author(s):

Mamoru Furuta ◽

Takahiro Hiramatsu ◽

Takashi Hirao

Keyword(s):

Inductively Coupled Plasma ◽

Low Frequency ◽

Chemical Vapor ◽

Substrate Bias ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Frequency Pulse

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Preparation of Phosphorus Doped Hydrogenated Microcrystalline Silicon Thin Films by Inductively Coupled Plasma Chemical Vapor Deposition and Their Characteristics for Solar Cell Applications

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2008.1265 ◽

2008 ◽

Vol 8 (10) ◽

pp. 5521-5526 ◽

Author(s):

Chaehwan Jeong ◽

Seongjae Boo ◽

Tae-Won Kim ◽

Bum-Ho Choi ◽

Ho-Sung Kim ◽

...

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Phosphorus Doped

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Low-temperature preparation of phosphorus doped μc-Si:H thin films by low-frequency inductively coupled plasma assisted chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2011.08.048 ◽

2012 ◽

Vol 520 (6) ◽

pp. 1724-1728 ◽

Author(s):

W.S. Yan ◽

D.Y. Wei ◽

Y.N. Guo ◽

S. Xu ◽

T.M. Ong ◽

...

Keyword(s):

Low Temperature ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Chemical Vapor ◽

Inductively Coupled ◽

Low Temperature Preparation ◽

Phosphorus Doped ◽

Temperature Preparation

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Crystalline silicon surface passivation by intrinsic silicon thin films deposited by low-frequency inductively coupled plasma

Journal of Applied Physics ◽

10.1063/1.4733701 ◽

2012 ◽

Vol 112 (1) ◽

pp. 013708 ◽

Author(s):

H. P. Zhou ◽

D. Y. Wei ◽

S. Xu ◽

S. Q. Xiao ◽

L. X. Xu ◽

...

Keyword(s):

Inductively Coupled Plasma ◽

Silicon Surface ◽

Surface Passivation ◽

Crystalline Silicon ◽

Low Frequency ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Silicon Surface Passivation

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Low-temperature deposition of µc-Si : H thin films by a low-frequency inductively coupled plasma for photovoltaic applications

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/46/21/215501 ◽

2013 ◽

Vol 46 (21) ◽

pp. 215501 ◽

Author(s):

D Y Wei ◽

S Q Xiao ◽

S Y Huang ◽

C S Chan ◽

H P Zhou ◽

...

Keyword(s):

Low Temperature ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Inductively Coupled ◽

Low Temperature Deposition ◽

Photovoltaic Applications ◽

Temperature Deposition

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Characterization of Low Temperature P-Type Hydrogenated Microcrystalline Silicon Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition

2007 Canadian Conference on Electrical and Computer Engineering ◽

10.1109/ccece.2007.243 ◽

2007 ◽

Author(s):

W. F. L. Tse ◽

I. Khodami ◽

M. M. Adachi ◽

X. Wang ◽

K. Kavanagh ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Silicon Thin Films ◽

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