Enhanced Nucleation of Microcrystalline Silicon Thin Films Deposited by Inductively Coupled Plasma Chemical Vapor Deposition with Low-Frequency Pulse Substrate Bias

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.050202 ◽

2010 ◽

Vol 49 (5) ◽

pp. 050202

Author(s):

Mamoru Furuta ◽

Takahiro Hiramatsu ◽

Takashi Hirao

Keyword(s):

Inductively Coupled Plasma ◽

Low Frequency ◽

Chemical Vapor ◽

Substrate Bias ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Frequency Pulse

Download Full-text

Preparation of Phosphorus Doped Hydrogenated Microcrystalline Silicon Thin Films by Inductively Coupled Plasma Chemical Vapor Deposition and Their Characteristics for Solar Cell Applications

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2008.1265 ◽

2008 ◽

Vol 8 (10) ◽

pp. 5521-5526 ◽

Author(s):

Chaehwan Jeong ◽

Seongjae Boo ◽

Tae-Won Kim ◽

Bum-Ho Choi ◽

Ho-Sung Kim ◽

...

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films ◽

Phosphorus Doped

Download Full-text

Effects of substrate temperature on structural, optical and morphological properties of hydrogenated nanocrystalline silicon thin films prepared by inductively coupled plasma chemical vapor deposition

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-015-3426-0 ◽

2015 ◽

Vol 26 (10) ◽

pp. 7790-7796 ◽

Author(s):

Dingyu Yang ◽

Xinghua Zhu ◽

Hui Sun ◽

Xiuying Gao ◽

Xu Li

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Morphological Properties ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Silicon Thin Films

Download Full-text

The effect of r.f. substrate bias on the properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2004.08.134 ◽

2005 ◽

Vol 193 (1-3) ◽

pp. 152-156 ◽

Author(s):

H.Y. Lee ◽

D.K. Lee ◽

D.H. Kang ◽

J.J. Lee ◽

J.H. Joo

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Carbon Nitride ◽

Chemical Vapor ◽

Substrate Bias ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

Download Full-text

Effect of Pulsed Substrate Bias on Film Properties of SiO2Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.03ca03 ◽

2010 ◽

Vol 49 (3) ◽

pp. 03CA03 ◽

Author(s):

Takahiro Hiramatsu ◽

Tokiyoshi Matsuda ◽

Hiroshi Furuta ◽

Hiroshi Nitta ◽

Toshiyuki Kawaharamura ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Substrate Bias ◽

Plasma Chemical ◽

Film Properties ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

Download Full-text

Influence of hydrogen dilution on the growth of nanocrystalline silicon carbide films by low-frequency inductively coupled plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2007.10.091 ◽

2008 ◽

Vol 516 (18) ◽

pp. 5991-5995 ◽

Author(s):

Qijin Cheng ◽

S. Xu ◽

J.W. Chai ◽

S.Y. Huang ◽

Y.P. Ren ◽

...

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Low Frequency ◽

Chemical Vapor ◽

Nanocrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Hydrogen Dilution ◽

Nanocrystalline Silicon Carbide

Download Full-text

Hydrogenated Microcrystalline Silicon Film Growth by Inductively Coupled Plasma–Chemical Vapor Deposition on ZrO2Gate Dielectric for Thin Film Transistors

Japanese Journal of Applied Physics ◽

10.1143/jjap.45.4365 ◽

2006 ◽

Vol 45 (5B) ◽

pp. 4365-4369 ◽

Author(s):

Chang-Wook Han ◽

Joong-Hyun Park ◽

Sang-Myeon Han ◽

Min-Koo Han ◽

Ki-Yong Kim ◽

...

Keyword(s):

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Film Growth ◽

Silicon Film ◽

Chemical Vapor ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Microcrystalline Silicon Film

Download Full-text

High rate deposition of microcrystalline silicon films using jet-type inductively coupled plasma chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2011.04.031 ◽

2012 ◽

Vol 86 (7) ◽

pp. 924-928 ◽

Author(s):

Zewen Zuo ◽

Yu Wang ◽

Jin Lu ◽

Junzhuan Wang ◽

Lin Pu ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Silicon Films ◽

High Rate ◽

Microcrystalline Silicon ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

Download Full-text

High voltage AlGaN/GaN Schottky barrier diode employing the inductively coupled plasma-chemical vapor deposition SiO2 passivation

2007 7th Internatonal Conference on Power Electronics ◽

10.1109/icpe.2007.4692351 ◽

2007 ◽

Author(s):

Young-Hwan Choi ◽

Jiyong Lim ◽

Kyu-Heon Cho ◽

Min-Koo Han

Keyword(s):

Chemical Vapor Deposition ◽

Schottky Barrier ◽

High Voltage ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

Download Full-text

Low Temperature Silicon Nitride and Silicon Dioxide Film Processing by Inductively Coupled Plasma Chemical Vapor Deposition

Journal of The Electrochemical Society ◽

10.1149/1.1393382 ◽

2000 ◽

Vol 147 (4) ◽

pp. 1481 ◽

Author(s):

J. W. Lee ◽

K. D. Mackenzie ◽

D. Johnson ◽

J. N. Sasserath ◽

S. J. Pearton ◽

...

Keyword(s):

Silicon Nitride ◽

Silicon Dioxide ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Silicon Dioxide Film ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Download Full-text

Electron Field Emission from a-C:F:N Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

SID Symposium Digest of Technical Papers ◽

10.1889/1.1833829 ◽

1998 ◽

Vol 29 (1) ◽

pp. 601

Author(s):

Suk Jae Chung ◽

Eun Jung Han ◽

Jong Hyun Moon ◽

Myung Hwan Oh ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

Download Full-text