AbstractFabrication of two- and three-dimensional (2D and 3D) structures in the micro- and nano-range allows a new degree of freedom to the design of materials by tailoring desired material properties and, thus, obtaining a superior functionality. Such complex designs are only possible using novel fabrication techniques with high resolution, even in the nanoscale range. Starting from a simple concept, transferring the shape of an interference pattern directly to the surface of a material, laser interferometric processing methods have been continuously developed. These methods enable the fabrication of repetitive periodic arrays and microstructures by irradiation of the sample surface with coherent beams of light. This article describes the capabilities of laser interference lithographic methods for the treatment of both photoresists and solid materials. Theoretical calculations are used to calculate the intensity distributions of patterns that can be realized by changing the number of interfering laser beams, their polarization, intensity and phase. Finally, different processing systems and configurations are described and, thus, demonstrating the possibility for the fast and precise tailoring of material surface microstructures and topographies on industrial relevant scales as well as several application cases for both methods.
Nanoporous silicon-based surface patterns fabricated by UV laser interference techniques for biological applications
