Measurement of the total stopping power of 5.3 MeV electrons in polystyrene by means of electron beam absorption in ferrous sulphate solution

Abstract Quantitative X-ray microanalysis requires the use of many fundamental constants related to the interaction of the electron beam with the sample. The current state of our knowledge of such constants in the particular areas of electron stopping power, X-ray ionization cross-sections, X-ray fluorescence yield, and the electron backscattering yield, is examined. It is found that, in every case, the quality and quantity of data available is poor, and that there are major gaps remaining to be filled.

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Reducing the Proximity Effect in Electron Lithography

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s1431927600001306 ◽

1980 ◽

Vol 38 ◽

pp. 310-311

Author(s):

M.R. Soqard

Keyword(s):

Electron Beam ◽

Multiple Scattering ◽

Proximity Effect ◽

Energy Deposition ◽

Incident Beam ◽

Stopping Power ◽

Local Energy ◽

Non Local ◽

The Mean ◽

Electron Lithography

When an electron beam is used to expose a resist, neighboring regions of the resist are also partially exposed. This arises from multiple scattering of the electrons in the resist and by backscattering of the electrons in both the resist and (mainly) in the substrate beneath the resist. From various studies1,2 this non-local energy deposition can be characterized by a number of regions, There is a very intense energy deposition, which is typically quite narrow and is produced by the direct incident beam broadened by multiple scattering in the resist. This is surrounded by an approximate plateau of intensity of about 1-2 orders of magnitude weaker, which is produced almost entirely by electrons backscattering from the substrate. The plateau arises from two conflicting effects: the backscattering yield drops as we move away from the central beam, but the mean electron energy also decreases. Therefore the stopping power increases, thus tending to offset the first effect. Finally this plateau cuts off fairly sharply at a distance approximately equal to the Bethe range of electrons in the substrate.

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Depth Dose Curves Determined by Ionization, Film Density, Ferrous Sulphate and Survival Rate of Coli Bacteria and Diploid Yeasts Using a 20 MeV Electron Beam

Symposium on High-Energy Electrons ◽

10.1007/978-3-642-88334-7_30 ◽

1965 ◽

pp. 140-142 ◽

Cited By ~ 3

Author(s):

A. Wambersie ◽

A. Dutreix ◽

J. Dutreix ◽

M. Tubiana

Keyword(s):

Electron Beam ◽

Survival Rate ◽

Ferrous Sulphate ◽

Film Density ◽

Depth Dose

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Supra-thermal electron beam stopping power and guiding in dense plasmas

Journal of Plasma Physics ◽

10.1017/s0022377813000305 ◽

2013 ◽

Vol 79 (4) ◽

pp. 429-435 ◽

Cited By ~ 7

Author(s):

JOÃO JORGE SANTOS ◽

D. BATANI ◽

S. D. BATON ◽

F. N. BEG ◽

T. CECCOTTI ◽

...

Keyword(s):

Electron Beam ◽

Fast Electron ◽

Dense Matter ◽

Stopping Power ◽

Rear Side ◽

X Rays ◽

Warm Dense Matter ◽

Thermal Electron ◽

Dense Plasmas ◽

Guided Propagation

AbstractFast-electron beam stopping mechanisms in media ranging from solid to warm dense matter have been investigated experimentally and numerically. Laser-driven fast electrons have been transported through solid Al targets and shock-compressed Al and plastic foam targets. Their propagation has been diagnosed via rear-side optical self-emission and Kα X-rays from tracer layers. Comparison between measurements and simulations shows that the transition from collision-dominated to resistive field-dominated energy loss occurs for a fast-electron current density ~5 × 1011 A cm−2. The respective increases in the stopping power with target density and resistivity have been detected in each regime. Self-guided propagation over 200μm has been observed in radially compressed targets due to ~1kT magnetic fields generated by resistivity gradients at the converging shock front.

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