A combined molecular dynamics and Monte Carlo simulation of the spatial distribution of energy deposition by proton beams in liquid water

2011 ◽  
Vol 56 (19) ◽  
pp. 6475-6493 ◽  
Author(s):  
Rafael Garcia-Molina ◽  
Isabel Abril ◽  
Santiago Heredia-Avalos ◽  
Ioanna Kyriakou ◽  
Dimitris Emfietzoglou
Keyword(s):  
Molecular Dynamics ◽  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Spatial Distribution ◽  
Liquid Water ◽  
Energy Deposition ◽  
Proton Beams

Monte Carlo Simulation on Energy Deposition of Low-Energy Electrons in Liquid Water

2004 ◽  
Vol 22 (1) ◽  
pp. 91-94 ◽  
Author(s):  
Tan Zhen-Yu ◽  
Xia Yue-Yuan ◽  
Zhao Ming-Wen ◽  
Liu Xiang-Dong ◽  
Huang Bo-Da ◽  
...  
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Liquid Water ◽  
Energy Deposition ◽  
Low Energy ◽  
Low Energy Electrons

Monte Carlo Simulation of Range and Energy Deposition by Electrons in Gaseous and Liquid Water

1996 ◽  
Vol 100 (20) ◽  
pp. 8595-8606 ◽  
Author(s):  
Simon M. Pimblott ◽  
Jay A. LaVerne ◽  
Asokendu Mozumder
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Liquid Water ◽  
Energy Deposition

Monte Carlo Simulation of the Spatial Distribution of Energy Deposition for an Electron Microbeam

2005 ◽  
Vol 163 (4) ◽  
pp. 468-472 ◽  
Author(s):  
D. J. Lynch ◽  
W. E. Wilson ◽  
M. T. Batdorf ◽  
M. B. Sowa Resat ◽  
G. A. Kimmel ◽  
...  
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Spatial Distribution ◽  
Energy Deposition

Estimation of Nanometer-Sized EB Patterning Using Energy Deposition Distribution in Monte Carlo Simulation

2011 ◽  
Vol 497 ◽  
pp. 127-132 ◽  
Author(s):  
Hui Zhang ◽  
Takuro Tamura ◽  
You Yin ◽  
Sumio Hosaka
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Electron Beam ◽  
Energy Distribution ◽  
Electron Energy ◽  
Electron Beam Lithography ◽  
Energy Deposition ◽  
Si Substrate ◽  
Positive Resist

We have studied on theoretical electron energy deposition in thin resist layer on Si substrate for electron beam lithography. We made Monte Carlo simulation to calculate the energy distribution and to consider formation of nanometer sized pattern regarding electron energy, resist thickness and resist type. The energy distribution in 100 nm-thick resist on Si substrate were calculated for small pattern. The calculations show that 4 nm-wide pattern will be formed when resist thickness is less than 30 nm. Furthermore, a negative resist is more suitable than positive resist by the estimation of a shape of the energy distribution.

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