Effects of transport gradients in a chemical vapor deposition reactor employing vapor–liquid–solid growth of ternary chalcogenide phase-change materials

2010 ◽  
Vol 21 (16) ◽  
pp. 165604 ◽  
Author(s):  
Derek C Johnson ◽  
Wesley D Morris ◽  
Amy L Prieto
2006 ◽  
Vol 100 (8) ◽  
pp. 084323 ◽  
Author(s):  
S. Christiansen ◽  
R. Schneider ◽  
R. Scholz ◽  
U. Gösele ◽  
Th. Stelzner ◽  
...  

2004 ◽  
Vol 831 ◽  
Author(s):  
J. Su ◽  
M. Gherasimova ◽  
G. Cui ◽  
J. Han ◽  
S. Lim ◽  
...  

ABSTRACTWe report flexible synthesis of III-Nitride nanowires and heterostructures by metal-organic chemical vapor deposition (MOCVD) via a catalytic vapor-liquid-solid (VLS) growth mechanism. Indium is used as an in-situ catalyst to facilitate and sustain the stability of liquid phase droplet for VLS growth based on thermodynamic consideration. The employment of mesoporous molecular sieves (MCM-41) helps to prevent the coalescence of catalyst droplets and to promote nucleation statistics. Cathodoluminescence (CL) of GaN nanowires shows near band-edge emission at 370nm, and strong E2 phonon peak is observed at room temperature in Raman scattering spectra. Both binary GaN and AlN nanowires have been synthesized by MOCVD. Three-dimensional AlN/GaN trunk-branch nanostructures are reported to illustrate the versatility of incorporating the VLS mechanism into MOCVD process.


CrystEngComm ◽  
2021 ◽  
Author(s):  
Naoki Sannodo ◽  
Tomohisa Kato ◽  
Yoshiyuki Yonezawa ◽  
Kazutoshi Kojima ◽  
Y. Matsumoto

A vapor-liquid-solid (VLS) mechanism has been successfully applied to homoepitaxial growth of 4H-SiC films in chemical vapor deposition (CVD), the key to which is the use of a Si-Pt alloy...


2011 ◽  
Vol 50 (10R) ◽  
pp. 105002 ◽  
Author(s):  
Marolop Simanullang ◽  
Koichi Usami ◽  
Tetsuo Kodera ◽  
Ken Uchida ◽  
Shunri Oda

2011 ◽  
Vol 50 (10) ◽  
pp. 105002 ◽  
Author(s):  
Marolop Simanullang ◽  
Koichi Usami ◽  
Tetsuo Kodera ◽  
Ken Uchida ◽  
Shunri Oda

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