Effects of Surface Pretreatment on Nucleation and Growth of Ultra-Nanocrystalline Diamond Films

2015 ◽  
Vol 17 (6) ◽  
pp. 496-501 ◽  
Author(s):  
Cong Liu ◽  
Jianhua Wang ◽  
Sijia Liu ◽  
Liwei Xiong ◽  
Jun Weng ◽  
...  
2012 ◽  
Vol 20 (4-7) ◽  
pp. 600-605 ◽  
Author(s):  
V. V. Chernov ◽  
A. L. Vikharev ◽  
A. M. Gorbachev ◽  
A. V. Kozlov ◽  
A. Ya. Vul' ◽  
...  

2007 ◽  
Vol 16 (4-7) ◽  
pp. 718-724 ◽  
Author(s):  
Anirudha V. Sumant ◽  
P.U.P.A. Gilbert ◽  
David S. Grierson ◽  
Andrew R. Konicek ◽  
Mike Abrecht ◽  
...  

2006 ◽  
Vol 532-533 ◽  
pp. 249-252 ◽  
Author(s):  
Fang Hong Sun ◽  
Zhi Ming Zhang ◽  
He Sheng Shen ◽  
Ming Chen

Nanocrystalline diamond films (NDFs) were deposited on mirror-polished silicon (100) substrates using a graphite-grid assisted hot filament chemical vapor deposition (HFCVD) technique. The evidence of nanocrystallinity, smoothness and purity was obtained by characterizing the sample with various advanced analyses. A graphite-grid was used as the DC electrode, which was pre-coated by diamond films and could emit electron when a negative bias was applied to the under electrode. The results show that the film consists of nanocrystalline diamond grains with sizes of about 7-15nm. The Raman spectroscopy, XRD pattern, HR-TEM image and SAED pattern of the films indicate the presence of nanocrystalline diamond. Surface roughness is measured as Ra<20nm by the profilometry scans. A large quantity of electrons emission from the graphite-grid and positive ions bombardment to the graphite-grid results in an enormous enhancement of the generation of diamond nuclei. Density of a diamond nuclei as high as 1010~1011/cm2 can be attained with this method. NDFs can be deposited on mirror-polished Si substrate surfaces without damaging surface pretreatment for nucleation enhancement. These ultra-smooth films will display excellent performances, which make them the best candidates for semiconductor and MEMS applications.


MRS Bulletin ◽  
1998 ◽  
Vol 23 (9) ◽  
pp. 36-41 ◽  
Author(s):  
P. Keblinski ◽  
D. Wolf ◽  
F. Cleri ◽  
S.R. Phillpot ◽  
H. Gleiter

The low-pressure synthesis of rather pure nanocrystalline diamond films from fullerene precursors suggests that for a small enough grain size the diamond structure may be energetically preferred over graphite. Because of the small grain size of typically about 15 nm in these films, a significant fraction of the carbon atoms is situated in the grain boundaries (GBs). The surprisingly high wear resistance of these films even after the substrate is removed and their high corrosion resistance suggest that the grains are strongly bonded. Grain-boundary carbon is also believed to be responsible for the absorption and scattering of light in these films, for their electrical conductivity, and for their electron-emission properties. In spite of all these indications of a critical role played by GB carbon in achieving the remarkable properties of nanocrystalline diamond films, to date the atomic structures of the GBs are essentially not known.It is well-known that the electronic and optical properties of polycrystalline silicon films are significantly affected by the presence of GBs. For example GBs can provide active sites for the recombination of electron-hole pairs in photovoltaic applications. Also, in electronic devices such as thin-film transistors, GBs are known to play an important role. Because of silicon's strong energetic preference for sp3 hybridization over other electronic configurations, the structural disorder in silicon GBs is accommodated by a distortion of the tetrahedral nearestneighbor bonds and in the extreme by the creation of dangling bonds—that is, of three-coordinated Si atoms each having one unsaturated, bound electron in an otherwise more or less tetrahedrally coordinated environment.


2008 ◽  
Vol 205 (9) ◽  
pp. 2146-2153 ◽  
Author(s):  
Milan Kopecek ◽  
Lucie Bacakova ◽  
Jiri Vacik ◽  
Frantisek Fendrych ◽  
Vladimir Vorlicek ◽  
...  

2005 ◽  
Vol 202 (11) ◽  
pp. 2212-2216 ◽  
Author(s):  
S. Wenmackers ◽  
P. Christiaens ◽  
M. Daenen ◽  
K. Haenen ◽  
M. Nesládek ◽  
...  

2006 ◽  
Vol 15 (4-8) ◽  
pp. 626-630 ◽  
Author(s):  
K.L. Ma ◽  
W.J. Zhang ◽  
Y.S. Zou ◽  
Y.M. Chong ◽  
K.M. Leung ◽  
...  

1994 ◽  
Vol 12 (4) ◽  
pp. 1491-1495 ◽  
Author(s):  
Dieter M. Gruen ◽  
Xianzheng Pan ◽  
Alan R. Krauss ◽  
Shengzhong Liu ◽  
Jianshu Luo ◽  
...  

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