Study of Non-Thermal DC Arc Plasma of CH4/Ar at Atmospheric Pressure Using Optical Emission Spectroscopy and Mass Spectrometry

2015 ◽  
Vol 17 (9) ◽  
pp. 743-748 ◽  
Author(s):  
Mengran Liao ◽  
Yu Wang ◽  
Hanfeng Wu ◽  
Hui Li ◽  
Weidong Xia
Keyword(s):  
Mass Spectrometry ◽  
Atmospheric Pressure ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Arc Plasma ◽  
Dc Arc

Parametric evaluation of ambient desorption optical emission spectroscopy utilizing a liquid sampling-atmospheric pressure glow discharge microplasma

2017 ◽  
Vol 32 (5) ◽  
pp. 931-941 ◽  
Author(s):  
Htoo W. Paing ◽  
R. Kenneth Marcus
Keyword(s):  
Glow Discharge ◽  
Atmospheric Pressure ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Atmospheric Pressure Glow Discharge ◽  
Operational Parameters ◽  
Pressure Glow Discharge ◽  
Liquid Sampling

The operational parameters of the AD-LS-APGD-OES microplasma have been evaluated in terms of understanding their roles in analyte response.

scholarly journals Quantitative Analysis of Thin Films by dc Arc Optical Emission Spectroscopy

1978 ◽  
Vol 32 (3) ◽  
pp. 281-287 ◽  
Author(s):  
Arnold W. Hogrefe ◽  
Robert K. Lowry
Keyword(s):  
Thin Films ◽  
Silicon Dioxide ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Aluminum Film ◽  
Gravimetric Analysis ◽  
Mixed Powder ◽  
Nickel Chromium ◽  
Dc Arc

dc arc optical emission spectroscopy was investigated as a quantitative method for measuring compositions of thin films commonly used in fabricating semiconductor devices. Thin films studied were nickel-chromium, phosphorus-silicon dioxide, and silicon-aluminum. Film samples were obtained by direct deposition onto ordinary graphite electrodes mounted in vacuum deposition chambers. Standards for each film were prepared by evaporating series of synthetic solutions approximating film compositions onto electrode tips, or by preparing appropriately weighed mixed powder standards. Calibration curves were established by burning multiple sets of these standard electrodes in a 15-A dc arc and plotting the intensity ratios for selected atomic lines of the analyte elements. Correlation of emission results with atomic absorption, electron microprobe, and gravimetric analysis showed absolute agreement to within ±3% for nickel-chromium, ± 0.3% for phosphorus-silicon dioxide, and ±0.2% for silicon-aluminum. Maximum relative percent error was 5, 10, and 12.5%, respectively. This technique has proved to be a rapid convenient process control tool in the manufacture of microelectronic devices.

Optical emission spectroscopy of atmospheric pressure microwave plasmas

2008 ◽  
Vol 104 (5) ◽  
pp. 054908 ◽  
Author(s):  
Haijun Jia ◽  
Hiroyuki Fujiwara ◽  
Michio Kondo ◽  
Hiroshi Kuraseko
Keyword(s):  
Atmospheric Pressure ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Microwave Plasmas
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