Comment on ‘Coincident ion acceleration and electron extraction for space propulsion using the self-bias formed on a set of RF biased grids bounding a plasma source’

2021 ◽  
Author(s):  
Sheng Hui Fu ◽  
Zhen- Feng Ding
Keyword(s):  
Plasma Source ◽  
The Self ◽  
Ion Acceleration ◽  
Space Propulsion ◽  
Self Bias ◽  
Electron Extraction

Ion acceleration in a helicon source due to the self-bias effect

2012 ◽  
Vol 19 (5) ◽  
pp. 053503 ◽  
Author(s):  
Matt Wiebold ◽  
Yung-Ta Sung ◽  
John E. Scharer
Keyword(s):  
The Self ◽  
Ion Acceleration ◽  
Bias Effect ◽  
Self Bias ◽  
Helicon Source

scholarly journals Characterization and Performance of Carbon Films Deposited by Plasma and Ion Beam Based Techniques

1994 ◽  
Vol 354 ◽  
Author(s):  
K.C. Walter ◽  
H. Kung ◽  
T. Levine ◽  
J.T. Tesmer ◽  
P. Kodali ◽  
...  
Keyword(s):  
Wear Rate ◽  
Surface Area ◽  
Ion Beam ◽  
Carbon Films ◽  
The Self ◽  
Line Of Sight ◽  
Rf Power ◽  
Hard Carbon ◽  
Self Bias ◽  
Cathodic Arc

AbstractPlasma and ion beam based techniques have been used to deposit carbon-based films. The ion beam based method, a cathodic arc process, used a magnetically mass analyzed beam and is inherently a line-of-sight process. Two hydrocarbon plasma-based, non-line-of-sight techniques were also used and have the advantage of being capable of coating complicated geometries. The self-bias technique can produce hard carbon films, but is dependent on rf power and the surface area of the target. The pulsed-bias technique can also produce hard carbon films but has the additional advantage of being independent of rf power and target surface area. Tribological results indicated the coefficient of friction is nearly the same for carbon films from each deposition process, but the wear rate of the cathodic arc film was five times less than for the self-bias or pulsed-bias films. Although the cathodic arc film was the hardest, contained the highest fraction of sp3 bonds and exhibited the lowest wear rate, the cathodic arc film also produced the highest wear on the 440C stainless steel counterface during tribological testing. Thus, for tribological applications requiring low wear rates for both counterfaces, coating one surface with a very hard, wear resistant film may detrimentally affect the tribological behavior of the counterface.

scholarly journals Redefinition of the self-bias voltage in a dielectrically shielded thin sheath RF discharge

2018 ◽  
Vol 123 (19) ◽  
pp. 193301 ◽  
Author(s):  
Teck Seng Ho ◽  
Christine Charles ◽  
Rod Boswell
Keyword(s):  
Bias Voltage ◽  
The Self ◽  
Rf Discharge ◽  
Self Bias

scholarly journals A Combined Effect of Self and Reward: Relationship of Self- and Reward-Bias on Associative Learning

2021 ◽  
Vol 12 ◽  
Author(s):  
Lingyun Wang ◽  
Yuxin Qi ◽  
Lihong Li ◽  
Fanli Jia
Keyword(s):  
Associative Learning ◽  
The Self ◽  
Combined Effect ◽  
Perceptual Processing ◽  
Complex Relationship ◽  
Learning Paradigm ◽  
Self Bias ◽  
High Reward ◽  
Reward Bias ◽  
Relationship Of

Previous studies have demonstrated that individuals process information related to themselves or a high reward quickly and have referred to this as self-bias or reward-bias. However, no previous study has presented self- and reward-bias simultaneously. The present study investigated perceptual processing using the associated learning paradigm when both self and reward were prioritized (condition of double salience) as well as when only self or reward was prioritized (condition of single salience). The present study established these two conditions by manipulating self-relevance (self vs. stranger in Experiment 1; self vs. friend in Experiment 2). The results showed that (1) when the self was pitted against a stranger and received a high or low reward, perceptual processing of the participants mainly involved self-bias (Experiment 1); (2) when the self was pitted against a friend, perceptual processing involved both self-bias and reward-bias (Experiment 2). The study revealed a complex relationship between self- and reward-bias, which depends on the degree of affinity between oneself and others.

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