Investigating the absorption performance of a monolayer coated absorber at oblique incidence

2021 ◽  
Author(s):  
Junming Zhang ◽  
Chang Liu ◽  
Tao Wang ◽  
Fashen Li
Keyword(s):  
Oblique Incidence ◽  
Absorption Performance

Absorption Performance of an Anechoic Layer with a Steel Plate Backing at Oblique Incidence

2018 ◽  
Vol 46 (3) ◽  
pp. 317-327 ◽  
Author(s):  
Fulin Zhou ◽  
Jun Fan ◽  
Bin Wang ◽  
Zilong Peng
Keyword(s):  
Oblique Incidence ◽  
Steel Plate ◽  
Absorption Performance

Titanium nitride nano-disk arrays-based metasurface as a perfect absorber in the visible range

2018 ◽  
Vol 32 (01) ◽  
pp. 1750365 ◽  
Author(s):  
Qiuqun Liang ◽  
Yongqi Fu ◽  
Xiongping Xia ◽  
Liu Wang ◽  
Rummei Gao
Keyword(s):  
Titanium Nitride ◽  
Oblique Incidence ◽  
Light Polarization ◽  
Visible Range ◽  
Perfect Absorber ◽  
Disk Arrays ◽  
Plasmonic Resonance ◽  
Intrinsic Loss ◽  
Absorption Performance ◽  
High Absorption

An ultrathin metasurface-based absorber consisting of titanium nitride (TiN) nano-disk arrays–dielectric layer-TiN substrate is proposed in this paper. The absorber exhibits near-unity absorption in the whole visible range of 380–780 nm. Our results demonstrate that the proposed metasurface-based absorber is not only independent of light polarization, but also exhibits angle-independent absorption behavior for oblique incidence up to 70[Formula: see text]. The high absorption performance of the TiN nano-disk arrays-based absorber can attribute to two different loss mechanisms associated with the intrinsic loss and plasmonic resonance.

Preparation and Electromagnetic Absorption Performance of Ni-RGO

2016 ◽  
Vol 31 (6) ◽  
pp. 567 ◽  
Author(s):  
XU Shuang-Shuang ◽  
CHEN Gong ◽  
ZHANG Hai-Qin ◽  
CHEN Yuan ◽  
ZHAO Yan
Keyword(s):  
Electromagnetic Absorption ◽  
Absorption Performance

Scattering Rings in Birefringent Porous Silicon

2003 ◽  
Vol 762 ◽  
Author(s):  
Claudio J. Oton ◽  
Zeno Gaburro ◽  
Mher Ghulinyan ◽  
Nicola Daldosso ◽  
Lucio Pancheri ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Light Scattering ◽  
Porous Silicon ◽  
Direct Measurement ◽  
Optical Anisotropy ◽  
Oblique Incidence ◽  
Laser Light ◽  
Anisotropic Scattering ◽  
Scattering Measurements

AbstractWe report the observation of strongly anisotropic scattering of laser light at oblique incidence on (100)-oriented porous silicon layers. We performed angle-resolved light scattering measurements and three concentric rings were observed. Modeling porous silicon by means of nanometric columnar air pores and an effective anisotropic uniaxial dielectric constant explains the observed phenomenon, and besides, the observation of the angle aperture of these rings allows a direct measurement of relative birefringence. We finally study the changes of optical anisotropy after different modifications of the structure.

Pb Electrodeposition in the Presence of Chlorine Ions on Cu(100): An in Situ Optical Reflectivity Difference Study

2003 ◽  
Vol 781 ◽  
Author(s):  
J. Gray ◽  
W. Schwarzacher ◽  
X.D. Zhu
Keyword(s):  
Oblique Incidence ◽  
Opposite Sign ◽  
Bulk Phase ◽  
Phase Layer ◽  
Optical Reflectivity ◽  
Scan Rate ◽  
Different Types ◽  
Chlorine Ions ◽  
High Overpotentials

AbstractWe studied the initial stages of the electrodeposition of Pb in the presence of chlorine ions on Cu(100), using an oblique-incidence optical reflectivity difference (OIRD) technique. The OI-RD results reveal that immediately following the underpotential deposition (UPD) of the first Pb monolayer, two different types of bulk-phase films grow depending upon the magnitude of overpotential and cyclic voltammetry (CV) scan rate. At low overpotentials and/or slow scan rates, we propose that a bulk-phase Pb film grows on top of the UPD monolayer. At high overpotentials and/or fast scan rates, either a PbO, PbCl2, or a rough Pb bulk-phase layer grows on top of the UPD layer such that the reflectivity difference signal from such a film has an opposite sign.

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