A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge.

Plasma Sources Science and Technology ◽

10.1088/1361-6595/abe0cc ◽

2021 ◽

Author(s):

Rainer Hippler ◽

Martin Cada ◽

Zdenek Hubicka

Keyword(s):

Magnetron Sputtering ◽

Hollow Cathode ◽

Energy Control ◽

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Review of ionized-PVD by hollow cathode magnetron sputtering

IEEE Conference Record - Abstracts. 1999 IEEE International Conference on Plasma Science. 26th IEEE International Conference (Cat. No.99CH36297) ◽

10.1109/plasma.1999.829299 ◽

2003 ◽

Author(s):

K.F. Lai ◽

Q. Lu

Keyword(s):

Magnetron Sputtering ◽

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7468. Effect of deposition parameters on properties of films deposited on fibers by hollow cathode magnetron sputtering

Vacuum ◽

10.1016/0042-207x(91)91536-w ◽

1991 ◽

Vol 42 (10-11) ◽

pp. 670

Keyword(s):

Magnetron Sputtering ◽

Hollow Cathode ◽

Deposition Parameters

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Comparison between conventional and hollow cathode magnetron sputtering systems on the growing of titanium dioxide thin films: a correlation between the gas discharge and film formation

The European Physical Journal Applied Physics ◽

10.1051/epjap/2011100453 ◽

2011 ◽

Vol 54 (2) ◽

pp. 20801 ◽

Author(s):

D. A. Duarte ◽

M. Massi ◽

A.S. da Silva Sobrinho

Keyword(s):

Titanium Dioxide ◽

Magnetron Sputtering ◽

Hollow Cathode ◽

Film Formation ◽

Gas Discharge ◽

Titanium Dioxide Thin Films

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Ionized hollow cathode magnetron sputtering

Ionized physical vapor deposition - Thin Films ◽

10.1016/s1079-4050(00)80007-1 ◽

2000 ◽

pp. 95-139 ◽

Author(s):

Kwok F. Lai

Keyword(s):

Magnetron Sputtering ◽

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Superconducting transport properties of YBa2Cu3O7−δ films grown by hollow cathode magnetron sputtering

Materials Letters ◽

10.1016/0167-577x(93)90139-o ◽

1993 ◽

Vol 17 (1-2) ◽

pp. 9-12

Author(s):

A.G. Chourey ◽

V.S. Shirodkar ◽

C.P. D'Souza ◽

P.R. Apte ◽

R. Pinto

Keyword(s):

Magnetron Sputtering ◽

Transport Properties ◽

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Hollow‐cathode‐enhanced magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.573889 ◽

1986 ◽

Vol 4 (3) ◽

pp. 393-396 ◽

Author(s):

J. J. Cuomo ◽

S. M. Rossnagel

Keyword(s):

Magnetron Sputtering ◽

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Summary Abstract: Aluminum deposition on optical fibers by a hollow cathode magnetron sputtering system

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.575293 ◽

1988 ◽

Vol 6 (3) ◽

pp. 1772-1774 ◽

Author(s):

N. Kumar ◽

K. Pourrezaei ◽

M. Ihsan

Keyword(s):

Magnetron Sputtering ◽

Optical Fibers ◽

Hollow Cathode ◽

Aluminum Deposition ◽

Sputtering System

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Inquiry the Anode Effect on Growth Thin Films on the Flat Glass in D.C Plasma Magnetron Sputtering by Hollow Cathode and Study About Optical Properties of Copper Film Sputtered on the Zinc Substrate in Different Conditions

IEEE Conference Record - Abstracts. 2005 IEEE International Conference on Plasma Science ◽

10.1109/plasma.2005.359151 ◽

2005 ◽

Author(s):

F. Bahadori ◽

M. Mahmoudzadeh ◽

H.R. Pourbalasi

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Hollow Cathode ◽

Copper Film ◽

Anode Effect ◽

Effect On Growth

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Deposition of Nb<inf>3</inf>Ge films on continuous stainless steel tapes by hollow cathode magnetron sputtering

IEEE Transactions on Magnetics ◽

10.1109/tmag.1981.1061718 ◽

1981 ◽

Vol 17 (6) ◽

pp. 3432-3434 ◽

Author(s):

Y. Hoshi ◽

N. Terada ◽

M. Naoe ◽

S. Yamanaka

Keyword(s):

Stainless Steel ◽

Magnetron Sputtering ◽

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Numerical analysis of geometry effects for target re-deposition during low pressure hollow cathode magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2010.07.016 ◽

2011 ◽

Vol 85 (6) ◽

pp. 657-661 ◽

Author(s):

Junqing Lu ◽

Guoqing Tao ◽

Chan Gyu Lee ◽

Jae Hong Yoon ◽

Tong Yul Cho

Keyword(s):

Numerical Analysis ◽

Magnetron Sputtering ◽

Hollow Cathode ◽

Low Pressure ◽

Geometry Effects

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