Deposition of Nb<inf>3</inf>Ge films on continuous stainless steel tapes by hollow cathode magnetron sputtering

1981 ◽  
Vol 17 (6) ◽  
pp. 3432-3434 ◽  
Author(s):  
Y. Hoshi ◽  
N. Terada ◽  
M. Naoe ◽  
S. Yamanaka
Keyword(s):  
Stainless Steel ◽  
Magnetron Sputtering ◽  
Hollow Cathode

Pilot Study of the Analytical Performance of the Pulsed Hollow Cathode Discharge Emission Source

1995 ◽  
Vol 49 (7) ◽  
pp. 890-899 ◽  
Author(s):  
Xiangjun Cai ◽  
J. C. Williams
Keyword(s):  
Stainless Steel ◽  
Electron Microscope ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Analytical Performance ◽  
Pulsed Discharge ◽  
Stainless Steel Cathode ◽  
Steel Cathode ◽  
Discharge Method ◽  
Scanning Electron

Proper conditioning of the hollow cathode by sputtering is critical to the analytical performance of the hollow cathode. A pulsed discharge procedure was developed to condition the 1.5- × 5-mm stainless steel cathode. A scanning electron microscope was used to study the surface structure resulting from the conditioning. The resulting hollow bottom was bulb-shaped and the surface was mirror-like, very smooth, and shiny. The emission intensities from smooth cathodes were greater that those from the rough ones. The precision obtained here was 3–5% for Na, 5–8% for Li, and 4–10% for K. Three working curves for each element were made on different days with different cathodes that had been conditioned in the same manner for 4 h by sputtering. The three working curves virtually coincided when plotted in the same figure, demonstrating the precision and reproducibility from day to day of the hollow cathode discharge method as developed in this laboratory. The 3-σ detection limits calculated from slopes of working curves are 0.32 pg, 0.35 pg, and 3.2 pg for Na, Li, and K, respectively.

Research on the Adhesion of Stainless Steel Film on Gd by Magnetron Sputtering

2011 ◽  
Vol 189-193 ◽  
pp. 129-136
Author(s):  
Xiao Qiu Zheng ◽  
Shi Kun Xie ◽  
Rong Xi Yi
Keyword(s):  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Stainless Steel ◽  
Magnetron Sputtering ◽  
Protective Coating ◽  
Tension Test ◽  
Dc Magnetron Sputtering ◽  
Thin Fiber ◽  
Scanning Electron ◽  
Strength Of Adhesion

In order to research the adhesion of sputtering protective coating of Gd. Gd substrates was coated with 1Cr18Ni9Ti by means of DC magnetron sputtering technology. The characteristics of the film were investigated by scanning electron microscopy (SEM), EDS, SPM and the adhesions of film was tested by tension test. The results show that the films of 1Cr18Ni9Ti are distributed by means of islands when the sputtering was initiated and the grains are like thin fiber. After a few minutes, the films are smooth and perfect, the interferences between 1Cr18Ni9Ti and Gd join together strongly, and the largest strength of adhesion is 24.7MPa when the sputtering density is 966 w/cm2 and the sputtering time is 8 minutes.

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