Characterization of the nanosized porous structure of black Si solar cells fabricated via a screen printing process

2012 ◽  
Vol 33 (6) ◽  
pp. 064007 ◽  
Author(s):  
Yehua Tang ◽  
Chunlan Zhou ◽  
Wenjing Wang ◽  
Su Zhou ◽  
Yan Zhao ◽  
...  
2018 ◽  
Vol 1124 ◽  
pp. 041009
Author(s):  
A Gajdos ◽  
P Skarvada ◽  
R Macku ◽  
N Papez ◽  
L Skvarenina ◽  
...  
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2018 ◽  
Vol 185 ◽  
pp. 283-286 ◽  
Author(s):  
L. Helmich ◽  
D.C. Walter ◽  
D. Bredemeier ◽  
R. Falster ◽  
V.V. Voronkov ◽  
...  

2020 ◽  
Vol 10 (2) ◽  
pp. 319-325 ◽  
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Sebastian Tepner ◽  
Linda Ney ◽  
Michael Linse ◽  
Andreas Lorenz ◽  
Maximilian Pospischil ◽  
...  

1983 ◽  
Vol 22 (S1) ◽  
pp. 517 ◽  
Author(s):  
Shuichi Nonomura ◽  
Hiroaki Okamoto ◽  
Hirotsugu Kida ◽  
Kouji Fukumoto ◽  
Yoshihiro Hamakawa
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2006 ◽  
Vol 910 ◽  
Author(s):  
Wolfhard Beyer ◽  
H.F.W. Dekkers

AbstractThe microstructure of a-Si:N:H films, which are applied as antireflection coating and for defect passivation in multicrystalline silicon (mc-Si) solar cells, was studied by gas effusion experiments. The results show for as-deposited material of low substrate temperatures (TS = 200 – 300°C) a predominant diffusion of molecular hydrogen for temperatures up to 800°C in agreement with the presence of interconnected openings (voids). At higher substrate temperatures, the material has a more compact structure and atomic hydrogen is the dominant diffusing species in the accessible temperature range. Annealing effects were also studied. The results are consistent with the concept that atomic hydrogen released from the a-Si:N:H coating serves for defect passivation in μc-Si solar cells.


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