scholarly journals Plasma Diagnostics and Characterizations of Reactive Magnetron Sputtered Copper Nitride Thin Films

2020 ◽  
Vol 928 ◽  
pp. 072029
Author(s):  
Mohammed K. Khalaf ◽  
Nisaan Saud ◽  
Muhammed Sh. Muhammed
Keyword(s):  
Thin Films ◽  
Plasma Diagnostics ◽  
Reactive Magnetron ◽  
Copper Nitride

Preferential Orientation of Photochromic Gadolinium Oxyhydrides

2020 ◽  
Author(s):  
Elbruz Murat Baba ◽  
Jose Montero ◽  
Dmitrii Moldarev ◽  
Marcos V. Moro ◽  
Max Wolff ◽  
...  
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Rare Earth ◽  
Preferential Orientation ◽  
Reactive Magnetron ◽  
Flow Ratio ◽  
Deposition Pressure ◽  
Step Process ◽  
Oxidation In Air ◽  
Key Parameter

<p>We report preferential orientation control in photochromic gadolinium oxyhydride (GdHO) thin films deposited by a two-step process. Gadolinium hydride (GdH<sub>2-x</sub>) films were grown by reactive magnetron sputtering, followed by oxidation in air. The preferential orientation, grain size, anion concentrations, and photochromic response of the films are strongly dependent on the deposition pressure. GdHO films show preferential orientation along the [100] direction and exhibit photochromism when synthesized at deposition pressures up to 5.8 Pa and. The photochromic contrast is larger than 20 % when the films are deposited below 2.8 Pa with 0.22 H<sub>2</sub>/Ar flow ratio. We argue that the degree of preferential orientation defines the oxygen concentration which is known to be a key parameter for photochromism in rare-earth oxyhydride thin films. The experimental observations described above are explained by the oxidation-induced decrease of the grain size as a result of the increase of the deposition pressure of the sputtering gas. </p>

Role of carbon in the formation of hard Ge1−xCx thin films by reactive magnetron sputtering

2011 ◽  
Vol 406 (13) ◽  
pp. 2658-2662 ◽  
Author(s):  
Chaoquan Hu ◽  
Liang Qiao ◽  
Hongwei Tian ◽  
Xianyi Lu ◽  
Qing Jiang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Fabrication of MgAl$_{2}$O$_{4}$ Thin Films on Ferromagnetic Heusler Alloy Fe$_{2}$CrSi by Reactive Magnetron Sputtering

2012 ◽  
Vol 51 (2) ◽  
pp. 02BM04 ◽  
Author(s):  
Naoto Fukatani ◽  
Keima Inagaki ◽  
Kenichiro Mari ◽  
Hirohito Fujita ◽  
Tetsuta Miyawaki ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Heusler Alloy ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Electronic properties of Cr1−xAlxN thin films deposited by reactive magnetron sputtering

2002 ◽  
Vol 420-421 ◽  
pp. 312-317 ◽  
Author(s):  
R Sanjinés ◽  
O Banakh ◽  
C Rojas ◽  
P.E Schmid ◽  
F Lévy
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Electronic Properties ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron
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