Properties of nickel oxide thin films deposited by RF reactive magnetron sputtering

Thin Solid Films ◽

10.1016/s0040-6090(02)00654-5 ◽

2002 ◽

Vol 420-421 ◽

pp. 54-61 ◽

Cited By ~ 103

Author(s):

Y.M. Lu ◽

W.S. Hwang ◽

J.S. Yang ◽

H.C. Chuang

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Nickel Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Nickel Oxide Thin Films

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Thickness dependent properties of nickel oxide thin films deposited by dc reactive magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2011.02.002 ◽

2011 ◽

Vol 85 (10) ◽

pp. 949-954 ◽

Cited By ~ 28

Author(s):

A. Mallikarjuna Reddy ◽

A. Sivasankar Reddy ◽

P. Sreedhara Reddy

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Nickel Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Dc Reactive Magnetron Sputtering ◽

Nickel Oxide Thin Films

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Preparation and characterization of Nickel Oxide thin films by direct current reactive magnetron sputtering at different substrate temperatures

Electronic Materials Letters ◽

10.1007/s13391-014-2181-3 ◽

2014 ◽

Vol 10 (5) ◽

pp. 887-892 ◽

Cited By ~ 7

Author(s):

A. Mallikarjuna Reddy ◽

Chang Woo Byun ◽

Seung Ki Joo ◽

A. Sivasankar Reddy ◽

P. Sreedhara Reddy

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Nickel Oxide ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Substrate Temperatures ◽

Nickel Oxide Thin Films

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The growth of indium-tin-oxide thin films on glass substrates using DC reactive magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2003.08.001 ◽

2003 ◽

Vol 72 (3) ◽

pp. 269-276 ◽

Cited By ~ 28

Author(s):

Ho-Chul Lee ◽

Ji-Yoon Seo ◽

Yong-Won Choi ◽

Dong-Wook Lee

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Glass Substrates ◽

Dc Reactive Magnetron Sputtering

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Temperature dependence of the optical properties of mixed oxide thin films deposited by reactive magnetron sputtering

10.1117/12.625069 ◽

2005 ◽

Author(s):

M. Vergöhl ◽

B. Hunsche ◽

A. Ritz

Keyword(s):

Thin Films ◽

Optical Properties ◽

Magnetron Sputtering ◽

Temperature Dependence ◽

Mixed Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films

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Fabrication of low-resistive p-type Al–N co-doped zinc oxide thin films by RF reactive magnetron sputtering

Physica B Condensed Matter ◽

10.1016/j.physb.2009.08.170 ◽

2009 ◽

Vol 404 (23-24) ◽

pp. 4846-4849 ◽

Cited By ~ 16

Author(s):

Hsin-Chun Lu ◽

Jo-Ling Lu ◽

Chi-You Lai ◽

Gwo-Mei Wu

Keyword(s):

Thin Films ◽

Zinc Oxide ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

P Type ◽

Co Doped

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Growth and Characterization of Tungsten Oxide Thin Films using the Reactive Magnetron Sputtering System

Journal of Inorganic and Organometallic Polymers and Materials ◽

10.1007/s10904-016-0380-0 ◽

2016 ◽

Vol 26 (4) ◽

pp. 889-894 ◽

Cited By ~ 8

Author(s):

S. Firoozbakht ◽

E. Akbarnejad ◽

A. Salar Elahi ◽

M. Ghoranneviss

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Tungsten Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Tungsten Oxide Thin Films ◽

Sputtering System

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WITHDRAWN: Deposition of nickel oxide-yttria stabilized zirconia thin films by reactive magnetron sputtering

International Journal of Hydrogen Energy ◽

10.1016/j.ijhydene.2018.01.076 ◽

2018 ◽

Cited By ~ 1

Author(s):

A.A. Solovyev ◽

A.M. Lebedynskiy ◽

A.V. Shipilova ◽

I.V. Ionov ◽

E.A. Smolyanskiy ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Nickel Oxide ◽

Reactive Magnetron Sputtering ◽

Yttria Stabilized Zirconia ◽

Reactive Magnetron ◽

Stabilized Zirconia

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Structure and optical parameters of Eu doped tellurium oxide thin films prepared by reactive magnetron sputtering method

Thin Solid Films ◽

10.1016/j.tsf.2019.137592 ◽

2019 ◽

Vol 691 ◽

pp. 137592 ◽

Cited By ~ 1

Author(s):

Marcin Łapiński ◽

Michalina Walas ◽

Anna Gapska ◽

Dorota Kulik ◽

Aneta Szmytke ◽

...

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Optical Parameters ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Tellurium Oxide

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Electrical and optical properties of tantalum oxide thin films prepared by reactive magnetron sputtering

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2011.08.019 ◽

2011 ◽

Vol 509 (41) ◽

pp. 9758-9763 ◽

Cited By ~ 12

Author(s):

A.X. Wei ◽

Z.X. Ge ◽

X.H. Zhao ◽

J. Liu ◽

Y. Zhao

Keyword(s):

Thin Films ◽

Optical Properties ◽

Magnetron Sputtering ◽

Tantalum Oxide ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Oxide Thin Films ◽

Electrical And Optical Properties

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Sensing and biosensing with screen printed electrodes modified with nanostructured nickel oxide thin films prepared by magnetron sputtering at oblique angles

Electrochemistry Communications ◽

10.1016/j.elecom.2018.07.020 ◽

2018 ◽

Vol 94 ◽

pp. 5-8 ◽

Cited By ~ 9

Author(s):

Pedro Salazar ◽

Francisco José García-García ◽

Agustín R. González-Elipe

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Nickel Oxide ◽

Oxide Thin Films ◽

Screen Printed Electrodes ◽

Nickel Oxide Thin Films ◽

Screen Printed

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