scholarly journals Structural and optical properties of amorphous TiO2 films deposited by reactive DC magnetron sputtering

Author(s):  
M Lavanya ◽  
S Sunita Ratnam ◽  
B Rajesh Kumar ◽  
T Subba Rao
2010 ◽  
Vol 256 (14) ◽  
pp. 4591-4595 ◽  
Author(s):  
Aïssa Keffous ◽  
Abdelhak Cheriet ◽  
Youcef Belkacem ◽  
Noureddine Gabouze ◽  
Assia Boukezzata ◽  
...  

2011 ◽  
Vol 189-193 ◽  
pp. 4430-4433 ◽  
Author(s):  
Sin Liang Ou ◽  
Chin Pao Cheng ◽  
Chin Yen Yeh ◽  
Chung Jen Chung ◽  
Kuo Sheng Kao ◽  
...  

The In10GexSb52-xSn23Te15 films (x = 2, 5, and 9) were deposited on nature oxidized silicon wafer and glass substrate by dc magnetron sputtering. The ZnS-SiO2 films were used as protective layers. The thickness of the In10GexSb52-xSn23Te15 film is 20 nm. We have studied the crystallization kinetics, structural and optical properties of the In10GexSb52-xSn23Te15 (x = 2, 5, and 9) recording films. It is found that the crystallization temperature of the film is increased with increasing Ge content. The optical contrasts of In10GexSb52-xSn23Te15 films with x = 2~9 are all higher than 30 % at a wavelength of 405 nm, showing that the films are suitable for blue laser optical recording media application.


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