Analysis of optical emission spectroscopy data during silicon etching in SF6/O2/Ar plasma

Plasma Science and Technology ◽

10.1088/2058-6272/ac24f4 ◽

2021 ◽

Author(s):

Dong Hwan Kim ◽

Jeong Eun Choi ◽

Sang Jeen Hong

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Silicon Etching ◽

Spectroscopy Data ◽

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Prediction of plasma etch process by using actinometry-based optical emission spectroscopy data and neural network

Journal of Materials Processing Technology ◽

10.1016/j.jmatprotec.2008.06.006 ◽

2009 ◽

Vol 209 (5) ◽

pp. 2620-2626 ◽

Author(s):

Byungwhan Kim ◽

Minji Kwon

Keyword(s):

Neural Network ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data ◽

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Statistical Analysis of Emission Intensity for Silicon Dioxide Etching Using Optical Emission Spectroscopy Data

Journal of the Korean Physical Society ◽

10.3938/jkps.55.1873 ◽

2009 ◽

Vol 55 (5(1)) ◽

pp. 1873-1876

Author(s):

Sang Jeen Hong ◽

Jin Su Park ◽

Dong Sun Seo ◽

Hyun Wook Kim

Keyword(s):

Statistical Analysis ◽

Silicon Dioxide ◽

Emission Intensity ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data

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Modeling and filtering of optical emission spectroscopy. Data for plasma etching systems

Proceedings of the 1997 American Control Conference (Cat. No.97CH36041) ◽

10.1109/acc.1997.611875 ◽

1997 ◽

Author(s):

S. Rangan ◽

C. Spanos ◽

K. Poolla

Keyword(s):

Plasma Etching ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data

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Characterization of a microsecond pulsed non-equilibrium atmospheric pressure Ar plasma using laser scattering and optical emission spectroscopy

Plasma Science and Technology ◽

10.1088/2058-6272/ab84e2 ◽

2020 ◽

Vol 22 (6) ◽

pp. 065404

Author(s):

Fengdong JIA ◽

Yong WU ◽

Qi MIN ◽

Maogen SU ◽

Keigo TAKEDA ◽

...

Keyword(s):

Atmospheric Pressure ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Laser Scattering ◽

Ar Plasma ◽

Non Equilibrium

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In-Situ Monitoring of Silicon Nanocrystal Deposition with Pulsed SiH4 Supply by Optical Emission Spectroscopy of Ar Plasma

10.7567/ssdm.2013.p-1-5 ◽

2013 ◽

Author(s):

K. Ikemoto ◽

Y. Nakamine ◽

Y. Kawano ◽

S. Oda

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

In Situ Monitoring ◽

Silicon Nanocrystal ◽

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Neural network modeling of reactive ion etching using optical emission spectroscopy data

IEEE Transactions on Semiconductor Manufacturing ◽

10.1109/tsm.2003.818976 ◽

2003 ◽

Vol 16 (4) ◽

pp. 598-608 ◽

Author(s):

Sang Jeen Hong ◽

G.S. May ◽

Dong-Cheol Park

Keyword(s):

Neural Network ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Network Modeling ◽

Reactive Ion Etching ◽

Optical Emission ◽

Neural Network Modeling ◽

Spectroscopy Data ◽

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In situ monitoring of silicon nanocrystal formation with pulsed SiH4supply by optical emission spectroscopy of Ar plasma

Japanese Journal of Applied Physics ◽

10.7567/jjap.53.116102 ◽

2014 ◽

Vol 53 (11) ◽

pp. 116102 ◽

Author(s):

Kazufumi Ikemoto ◽

Yoshifumi Nakamine ◽

Yukio Kawano ◽

Shunri Oda

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

In Situ Monitoring ◽

Silicon Nanocrystal ◽

Nanocrystal Formation ◽

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Calculation of the Precursor Flux from Optical Emission Spectroscopy Data in Plasma Enhanced Chemical Vapour Deposition of Silane and its Correlation with the Deposition Rate

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.3955 ◽

2002 ◽

Vol 41 (Part 1, No. 6A) ◽

pp. 3955-3960 ◽

Author(s):

Partha Pratim Ray ◽

Namita Dutta Gupta ◽

Partha Chaudhuri

Keyword(s):

Deposition Rate ◽

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Chemical Vapour ◽

Optical Emission ◽

Spectroscopy Data

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In-situ virtual metrology for the silicon-dioxide etch rate by using optical emission spectroscopy data

Journal of the Korean Physical Society ◽

10.3938/jkps.65.168 ◽

2014 ◽

Vol 65 (2) ◽

pp. 168-175 ◽

Author(s):

Boomsoo Kim ◽

Sang Jeen Hong

Keyword(s):

Silicon Dioxide ◽

Emission Spectroscopy ◽

Etch Rate ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data ◽

Virtual Metrology

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Modeling and filtering of optical emission spectroscopy data for plasma etching systems

1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) ◽

10.1109/issm.1997.664507 ◽

2002 ◽

Author(s):

S. Rangan ◽

C. Spanos ◽

K. Poolla

Keyword(s):

Plasma Etching ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data

Download Full-text