Correlation of Stress and Atomic-Scale Surface Roughness Evolution during Intermittent Homoepitaxial Growth of (111)-Oriented Ag and Cu

2004 ◽  
Vol 93 (5) ◽  
Author(s):  
C. Friesen ◽  
C. V. Thompson
Wear ◽  
1993 ◽  
Vol 168 (1-2) ◽  
pp. 127-133 ◽  
Author(s):  
Judith A. Harrison ◽  
Richard J. Colton ◽  
Carter T. White ◽  
Donald W. Brenner

2011 ◽  
Vol 86 ◽  
pp. 584-589
Author(s):  
Fang Li Duan ◽  
He Bing Qiu ◽  
Ji Ming Yang ◽  
Cong Ying Wu

Large-scale molecular dynamics simulations are performed to study the effect of atomic-scale surface roughness on nano-contact. The modeling system consists of rigid spherical tips with different surface roughness and elastic flat substrate. Our results show that atomic-scale multi-asperity can change the contact behavior from consistent with the Hertz model to the Persson model. However, adhesion will reduce the influence of surface roughness, to the extent that the two tips with different roughness show similar variations of real contact area with applied load. The maximum compression and tensile stress of the rough tip is about 2 times and 1.5 times that of the smooth one, respectively. Moreover, the rough tip exhibits larger repulsive force and attractive force in the entire range of simulated load. Our simulations suggest that pull-off force cannot characterize the extent of the influence of adhesion on contact behavior at the nanoscale.


1999 ◽  
Vol 567 ◽  
Author(s):  
T. Hattori ◽  
M. Fujimura ◽  
H. Nohira

ABSTRACTThe atomic-scale surface roughness of ultrathin thermal oxides formed on Si(100) were studied as a function of oxide film thickness up to the thickness of 2.0 nm. The height deviation on oxide surface is limited within single atomic-step height of 0.135 nm on Si(100) surface below the oxide film thickness of about 1 nm, but above this thickness the height deviation increases with the increase in thickness at 700°C. This increase in height deviation with thickness must be produced by the relaxation of oxidation–induced stress in bulk SiO2. Furthermore, the oscillation in surface roughness with constant amplitude and its oscillating period in oxide film thickness of 0.19 nm were found.


Langmuir ◽  
2013 ◽  
Vol 29 (23) ◽  
pp. 6876-6883 ◽  
Author(s):  
Kenneth J. T. Livi ◽  
Bernhard Schaffer ◽  
David Azzolini ◽  
Che R. Seabourne ◽  
Trevor P. Hardcastle ◽  
...  

1998 ◽  
Vol 318 (1-2) ◽  
pp. 52-56 ◽  
Author(s):  
Jun-ichiro Takano ◽  
Osamu Takai ◽  
Yoshiaki Kogure ◽  
Masao Doyama

2012 ◽  
Vol 10 (0) ◽  
pp. 591-593
Author(s):  
Katsumi Shimizu ◽  
Syoushi Higuchi ◽  
Amane Kitahara ◽  
Hikaru Terauchi ◽  
Isao Takahashi

2009 ◽  
Vol 603 (10-12) ◽  
pp. 1315-1327 ◽  
Author(s):  
F. Besenbacher ◽  
J.V. Lauritsen ◽  
T.R. Linderoth ◽  
E. Lægsgaard ◽  
R.T. Vang ◽  
...  

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