Development and Characterization of High Temperature Plasma Nitridation Process for Advanced CMOS Technology Application
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1985 ◽
Vol 85
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pp. 365-368
2012 ◽
Vol 82
(4)
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pp. 808-814
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2008 ◽
Vol 79
(10)
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pp. 10F333
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1986 ◽
Vol 57
(8)
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pp. 2041-2042
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