Real-time in-situ measurement of the penetration depth in short pulse laser percussion drilling of metal targets

Author(s):  
F. P. Mezzapesa ◽  
A. Ancona ◽  
T. Sibillano ◽  
F. De Lucia ◽  
M. Dabbicco ◽  
...  
2011 ◽  
Author(s):  
Francesco P. Mezzapesa ◽  
Antonio Ancona ◽  
Teresa Sibillano ◽  
Francesco De Lucia ◽  
Maurizio Dabbicco ◽  
...  

2012 ◽  
Vol 107 (2) ◽  
pp. 445-454 ◽  
Author(s):  
O. J. Allegre ◽  
W. Perrie ◽  
K. Bauchert ◽  
D. Liu ◽  
S. P. Edwardson ◽  
...  

2006 ◽  
Vol 45 (No. 34) ◽  
pp. L913-L916 ◽  
Author(s):  
Shu Nakamura ◽  
Yoshihisa Iwashita ◽  
Akira Noda ◽  
Toshiyuki Shirai ◽  
Hiromu Tongu ◽  
...  

Author(s):  
F. Beaudoin ◽  
P. Perdu ◽  
C. DeNardi ◽  
R. Desplats ◽  
J. Lopez ◽  
...  

Abstract Ultra-short pulse laser ablation is applied to IC backside sample preparation. It is contact-less, non-thermal, precise and can ablate the various types of material present in IC packages. This study concerns the optimization of ultra-short pulse laser ablation for silicon thinning. Uncontrolled silicon roughness and poor uniformity of the laser thinned cavity needed to be tackled. Special care is taken to minimize the silicon RMS roughness to less than 1µm. Application to sample preparation of 256Mbit devices is presented.


2013 ◽  
Vol 115 (4) ◽  
pp. 1469-1477 ◽  
Author(s):  
Evgeny Kharanzhevskiy ◽  
Sergey Reshetnikov

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