Mask Design Method for Un-Patterned Dark Field Defect Inspection System

Author(s):  
Chao Liu ◽  
Shuang Xu ◽  
Cheng Liao ◽  
Yufei Liu
2010 ◽  
Vol 118-120 ◽  
pp. 762-766 ◽  
Author(s):  
Yu Lan Wei ◽  
Yun Hui Yan ◽  
Bing Li ◽  
Jia Hui Cong

Base on the study of the light reflectivity of steel surfaces, the interaction of CCD Camera and Illumination is investigated through experience. A new bright-dark filed defect recognition method which combines bright-filed mode and dark-filed mode is proposed. The bright-filed defect and dark-field defect on the surface of the strip steel can be detected at the same time through this new way, and the quantity of the defect information is increased. Therefore, the recognized defect type is twice the tradition way. A new algorithm of defect detection which is proper to bright-dark filed mode is proposed, too. This method is based on the image fusion. Experiment results show that detection rate of defects is more than 95% while classification rate of defects is over 85%.


Author(s):  
Mike Santana ◽  
Alfredo V. Herrera

Abstract This paper describes a methodology for correlating physical defect inspection/navigation systems with electrical bitmap data through the fabrication of artificial defects via reticle alterations or circuit modifications using an inline FIB. The methodology chosen consisted of altering decommissioned reticles to create defects resulting in both open and shorted circuits within areas of an AMD microprocessor cache. The reticles were subsequently scanned using a KLA SL300HR StarLight inspection system to confirm their location, while wafers processed on these reticles were scanned at several layers using standard inline metrology. Finally, the wafers were electrically tested, bitmapped, and physically deprocessed. All defect data was then analyzed and cross-correlated between each system, uncovering some important system deficiencies and learning opportunities. Data and images are included to support the significance and effectiveness of such a methodology.


2018 ◽  
Author(s):  
W.F. Hsieh ◽  
Henry Lin ◽  
Vincent Chen ◽  
Irene Ou ◽  
Y.S. Lou

Abstract This paper describes the investigation of donut-shaped probe marker discolorations found on Al bondpads. Based on SEM/EDS, TEM/EELS, and Auger analysis, the corrosion product is a combination of aluminum, fluorine, and oxygen, implying that the discolorations are due to the presence of fluorine. Highly accelerated stress tests simulating one year of storage in air resulted in no new or worsening discolorations in the affected chips. In order to identify the exact cause of the fluorine-induced corrosion, the authors developed an automated inspection system that scans an entire wafer, recording and quantifying image contrast and brightness variations associated with discolorations. Dark field TEM images reveal thickness variations of up to 5 nm in the corrosion film, and EELS line scan data show the corresponding compositional distributions. The findings indicate that fluorine-containing gases used in upstream processes leave residues behind that are driven in to the Al bondpads by probe-tip forces and activated by the electric field generated during CP testing. The knowledge acquired has proven helpful in managing the problem.


2014 ◽  
Vol 484-485 ◽  
pp. 540-546
Author(s):  
Yi Xu

Image mosaics not only can make the collected several original images regenerate a complete image, but also can correct the error caused by imaging distortion of the original images, which can achieve the objective of rapid and correct mosaic image. The program studies the image mosaics of wafer defect inspection system. For the problem that the field range taken by CCD camera under resolution of wafer defect inspection system is small, which cant get the whole wafer image once and influences the extraction of subsequent defect features, the study demands to add image mosaics to the system.


2021 ◽  
Author(s):  
Shengzeng Huo ◽  
David Navarro-Alarcon ◽  
David TW Chik

2019 ◽  
Vol 68 (8) ◽  
pp. 2830-2848
Author(s):  
Chun-Fu Lin ◽  
Sheng-Fuu Lin ◽  
Chi-Hung Hwang ◽  
Hao-Kai Tu ◽  
Chih-Yen Chen ◽  
...  

Author(s):  
Hiroyuki Kayaba ◽  
Hidenori Takauji ◽  
Shun'ichi Kaneko ◽  
Masataka Toda ◽  
Kouji Kuno ◽  
...  

1999 ◽  
Author(s):  
Seongtae Jeong ◽  
Lewis E. Johnson ◽  
Yun Lin ◽  
Senajith Rekawa ◽  
Pei-yang Yan ◽  
...  

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