InP FinFETs with damage-free and record high-aspect-ratio (45∶1) fins fabricated by metal-assisted chemical etching
2017 ◽
Vol 16
(4)
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pp. 567-573
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2018 ◽
Vol 28
(5)
◽
pp. 055006
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2014 ◽
Vol 24
(12)
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pp. 125026
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Keyword(s):
2015 ◽
Vol 4
(9)
◽
pp. P337-P346
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Keyword(s):
2014 ◽
Vol 6
(19)
◽
pp. 16782-16791
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2018 ◽
Vol 29
(21)
◽
pp. 18178-18178
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Keyword(s):