Proximity gettering technology for advanced CMOS image sensors using C3H5 carbon cluster Ion implantation techniques

2017 ◽  
Author(s):  
Kazunari Kurita ◽  
Takeshi Kadono ◽  
Ryosuke Okuyama ◽  
Ayumi Masada ◽  
Ryou Hirose Yoshihiro Koga ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Carbon Cluster ◽  
Image Sensors ◽  
Cmos Image Sensors ◽  
Implantation Techniques ◽  
Cluster Ion

Proximity gettering technology for advanced CMOS image sensors using carbon cluster ion‐implantation technique: A review

2017 ◽  
Vol 214 (7) ◽  
pp. 1700216 ◽  
Author(s):  
Kazunari Kurita ◽  
Takeshi Kadono ◽  
Ryousuke Okuyama ◽  
Satoshi Shigemastu ◽  
Ryo Hirose ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Carbon Cluster ◽  
Image Sensors ◽  
Implantation Technique ◽  
Cmos Image Sensors ◽  
Cluster Ion

scholarly journals Proximity gettering technology for advanced CMOS image sensors using carbon cluster ion‐implantation technique: A review (Phys. Status Solidi A 7∕2017)

2017 ◽  
Vol 214 (7) ◽  
pp. 1770141
Author(s):  
Kazunari Kurita ◽  
Takeshi Kadono ◽  
Ryousuke Okuyama ◽  
Satoshi Shigemastu ◽  
Ryo Hirose ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Carbon Cluster ◽  
Image Sensors ◽  
Implantation Technique ◽  
Cmos Image Sensors ◽  
Cluster Ion

scholarly journals Effect of low-oxygen-concentration layer on iron gettering capability of carbon-cluster ion-implanted Si wafer for CMOS image sensors

2018 ◽  
Vol 57 (2) ◽  
pp. 021304 ◽  
Author(s):  
Ayumi Onaka-Masada ◽  
Toshiro Nakai ◽  
Ryosuke Okuyama ◽  
Hidehiko Okuda ◽  
Takeshi Kadono ◽  
...  
Keyword(s):  
Oxygen Concentration ◽  
Carbon Cluster ◽  
Image Sensors ◽  
Low Oxygen ◽  
Cmos Image Sensors ◽  
Concentration Layer ◽  
Cluster Ion ◽  
Low Oxygen Concentration ◽  
Si Wafer ◽  
Ion Implanted

scholarly journals Room-temperature bonding of epitaxial layer to carbon-cluster ion-implanted silicon wafers for CMOS image sensors

2018 ◽  
Vol 57 (6) ◽  
pp. 061302 ◽  
Author(s):  
Yoshihiro Koga ◽  
Takeshi Kadono ◽  
Satoshi Shigematsu ◽  
Ryo Hirose ◽  
Ayumi Onaka-Masada ◽  
...  
Keyword(s):  
Epitaxial Layer ◽  
Room Temperature ◽  
Carbon Cluster ◽  
Image Sensors ◽  
Silicon Wafers ◽  
Cmos Image Sensors ◽  
Cluster Ion ◽  
Ion Implanted

Gettering Technology for CMOS Image Sensors Using a Cluster Ion Implantation

Hyomen Kagaku ◽  
2016 ◽  
Vol 37 (3) ◽  
pp. 104-109 ◽  
Author(s):  
Kazunari KURITA ◽  
Takeshi KADONO ◽  
Ryousuke OKUYAMA ◽  
Ryo HIROSE ◽  
Ayumi MASADA ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Image Sensors ◽  
Cmos Image Sensors ◽  
Cluster Ion

Silicon Wafer Gettering Design for Advanced CMOS Image Sensors Using Hydrocarbon Molecular Ion Implantation: A review

2021 ◽  
Author(s):  
Kazunari Kurita ◽  
Takeshi Kadono ◽  
Ryosuke Okuyama ◽  
Ayumi Onaka-Masada ◽  
Satoshi Shigematsu ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Silicon Wafer ◽  
Image Sensors ◽  
Molecular Ion ◽  
Cmos Image Sensors

Cluster Ion Implantation for Process Application -Carbon Cluster co-Implantation-

2011 ◽  
Author(s):  
M. Tanjyo ◽  
T. Nagayama ◽  
H. Onoda ◽  
N. Hamamoto ◽  
S. Umisedo ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Carbon Cluster ◽  
Cluster Ion

Proximity gettering of C3H5carbon cluster ion-implanted silicon wafers for CMOS image sensors: Gettering effects of transition metal, oxygen, and hydrogen impurities

2016 ◽  
Vol 55 (12) ◽  
pp. 121301 ◽  
Author(s):  
Kazunari Kurita ◽  
Takeshi Kadono ◽  
Ryousuke Okuyama ◽  
Ryo Hirose ◽  
Ayumi Onaka-Masada ◽  
...  
Keyword(s):  
Transition Metal ◽  
Image Sensors ◽  
Silicon Wafers ◽  
Cmos Image Sensors ◽  
Cluster Ion ◽  
Ion Implanted

scholarly journals A Review of Proximity Gettering Technology for CMOS Image Sensors Using Hydrocarbon Molecular Ion Implantation

2019 ◽  
Vol 31 (6) ◽  
pp. 1939 ◽  
Author(s):  
Kazunari Kurita ◽  
Takeshi Kadono ◽  
Ryousuke Okuyama ◽  
Satoshi Shigematsu ◽  
Ryo Hirose ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Image Sensors ◽  
Molecular Ion ◽  
Cmos Image Sensors
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