Erratum: “Proximity gettering of C3H5 carbon cluster ion-implanted silicon wafers for CMOS image sensors: Gettering effects of transition metal, oxygen, and hydrogen impurities”
2017 ◽
Vol 56
(4)
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pp. 049201
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2016 ◽
Vol 55
(12)
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pp. 121301
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2018 ◽
Vol 57
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2017 ◽
Vol 214
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pp. 1700216
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2022 ◽
Vol 137
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pp. 106211
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