Enhancement of Magnetic Dipole Spontaneous Emission with Silicon Hollow Nanocuboid Resonator in Visible Range

Author(s):  
Suanur Kaba ◽  
Yakup Hames ◽  
Erdem Aslan ◽  
Ekin Aslan
2000 ◽  
Vol 638 ◽  
Author(s):  
X. Zianni ◽  
A.G. Nassiopoulou

AbstractWe present calculations on the spontaneous emission rates of Si rectangular quantum wires grown in the {100} plane. The electron and holes states are calculated within an effective mass approximation model. For holes, the minimum of the one-dimensional sub-bands is at the Γ- point. For electrons, the six anisotropic valleys at the conduction band minimum of bulk Si are not equivalent in the quantum wires and so, the minima of the energy sub-bands depend on the growth direction of the wire. For some wire directions in the {100} plane, the minimum of the ground electron sub-band is at the Γ-point. The directional dependence of the electron states is reflected on the spontaneous emission of the quantum wires. Light emission from Si quantum wires of diameters of a few nanometers can have direct transition character in the visible range. Phonon assisted transitions are then also present, but their intensity is three orders of magnitude smaller than the intensity of direct transitions. In Si quantum wires with indirect band gap the intensity and the peak position of the phonon assisted transitions exhibit dependence on the wires direction.


2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Mojtaba Karimi Habil ◽  
Carlos J. Zapata–Rodríguez ◽  
Mauro Cuevas ◽  
Samad Roshan Entezar

AbstractWe propose an axisymmetric silicon nanoresonator with designed tapered angle well for the extraordinary enhancement of the decay rate of magnetic dipole (MD) emitters. Due to the resonant coupling of a MD emitter and the MD mode of the subwavelength resonator, the Purcell factor (PF) can easily reach 500, which is significantly higher than the PF when using a silicon nanosphere of the same size. The PF and the resonance frequency are conveniently tuned through the resonator diameter and the taper angle of the blind hole. When supported by a metallic substrate, further enhancement ($$>10^3$$ > 10 3 ) of the MD spontaneous emission is triggered by an image-induced quadrupolar high-Q mode of the nanoantenna. For the sake of comparison we include a critical analysis of the canonical problem that considers a Si spherical shell. Our results might facilitate a novel strategy for promising realizations of chip-scale nanophotonic applications.


2017 ◽  
Vol 11 (3) ◽  
pp. 1600268 ◽  
Author(s):  
Denis G. Baranov ◽  
Roman S. Savelev ◽  
Sergey V. Li ◽  
Alexander E. Krasnok ◽  
Andrea Alù

ACS Nano ◽  
2011 ◽  
Vol 5 (8) ◽  
pp. 6586-6592 ◽  
Author(s):  
Stefan Mühlig ◽  
Alastair Cunningham ◽  
Sebastian Scheeler ◽  
Claudia Pacholski ◽  
Thomas Bürgi ◽  
...  

2017 ◽  
Vol 11 (3) ◽  
pp. 1770031 ◽  
Author(s):  
Denis G. Baranov ◽  
Roman S. Savelev ◽  
Sergey V. Li ◽  
Alexander E. Krasnok ◽  
Andrea Alù

Author(s):  
F. A. Ponce ◽  
R. L. Thornton ◽  
G. B. Anderson

The InGaAlP quaternary system allows the production of semiconductor lasers emitting light in the visible range of the spectrum. Recent advances in the visible semiconductor diode laser art have established the viability of diode structures with emission wavelengths comparable to the He-Ne gas laser. There has been much interest in the growth of wide bandgap quaternary thin films on GaAs, a substrate most commonly used in optoelectronic applications. There is particular interest in compositions which are lattice matched to GaAs, thus avoiding misfit dislocations which can be detrimental to the lifetime of these materials. As observed in Figure 1, the (AlxGa1-x)0.5In0.5P system has a very close lattice match to GaAs and is favored for these applications.In this work, we have studied the effect of silicon diffusion in GaAs/InGaAlP structures. Silicon diffusion in III-V semiconductor alloys has been found to have an disordering effect which is associated with removal of fine structures introduced during growth. Due to the variety of species available for interdiffusion, the disordering effect of silicon can have severe consequences on the lattice match at GaAs/InGaAlP interfaces.


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