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A comparative study of analog/RF performance: Symmetric and asymmetric underlap gate stack DG-MOSFETs
2016 3rd International Conference on Devices, Circuits and Systems (ICDCS)
◽
10.1109/icdcsyst.2016.7570646
◽
2016
◽
Cited By ~ 1
Author(s):
Arpan Dasgupta
◽
Rahul Das
◽
Arka Dutta
◽
Atanu Kundu
◽
Chandan K. Sarkar
Keyword(s):
Comparative Study
◽
Gate Stack
◽
Rf Performance
Download Full-text
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References
Analog/RF Performance of Graded Channel Gate Stack Triple Material Double Gate Strained-Si MOSFET with Fixed Charges
Silicon
◽
10.1007/s12633-021-01028-0
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2021
◽
Author(s):
Subba Rao Suddapalli
◽
Bheema Rao Nistala
Keyword(s):
Double Gate
◽
Gate Stack
◽
Strained Si
◽
Fixed Charges
◽
Channel Gate
◽
Rf Performance
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A Comparative Study of AC Positive Bias Temperature Instability of Germanium nMOSFETs with GeO2/Ge and Si-cap/Ge Gate Stack
IEEE Journal of the Electron Devices Society
◽
10.1109/jeds.2021.3078540
◽
2021
◽
pp. 1-1
Author(s):
Rui Gao
◽
Jigang Ma
◽
Xiaoling Lin
◽
Xiaowen Zhang
◽
Yunfei En
◽
...
Keyword(s):
Comparative Study
◽
Positive Bias
◽
Gate Stack
◽
Temperature Instability
◽
Bias Temperature Instability
Download Full-text
Localized breakdown in dielectrics and macroscopic charge transport through the whole gate stack: A comparative study
Applied Physics Letters
◽
10.1063/1.2830814
◽
2008
◽
Vol 92
(1)
◽
pp. 012914
◽
Cited By ~ 2
Author(s):
Yi Zheng
◽
Andrew T. S. Wee
◽
Yi Ching Ong
◽
K. L. Pey
◽
Cedric Troadec
◽
...
Keyword(s):
Comparative Study
◽
Charge Transport
◽
Gate Stack
Download Full-text
Impact of high K layer material on Analog/RF performance of forward and reversed Graded channel Gate Stack DG-MOSFETs
2016 3rd International Conference on Devices, Circuits and Systems (ICDCS)
◽
10.1109/icdcsyst.2016.7570633
◽
2016
◽
Author(s):
Sanjit Kumar Swain
◽
Sarosij Adak
◽
Arka Dutta
◽
Godwin Raj
◽
Chandan Kumar Sarkar
Keyword(s):
Gate Stack
◽
Layer Material
◽
High K
◽
Channel Gate
◽
Rf Performance
Download Full-text
Analog/RF Performance of Triple Material Gate Stack-Graded Channel Double Gate-Junctionless Strained-silicon MOSFET with Fixed Charges
Silicon
◽
10.1007/s12633-021-01462-0
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2021
◽
Author(s):
Suddapalli Subba Rao
◽
Rani Deepika Balavendran Joseph
◽
Vijaya Durga Chintala
◽
Gopi Krishna Saramekala
◽
D. Srikar
◽
...
Keyword(s):
Strained Silicon
◽
Double Gate
◽
Gate Stack
◽
Fixed Charges
◽
Rf Performance
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Influence of Underlap on Gate Stack DG-MOSFET for analytical study of Analog/RF performance
Superlattices and Microstructures
◽
10.1016/j.spmi.2016.04.013
◽
2016
◽
Vol 94
◽
pp. 60-73
◽
Cited By ~ 17
Author(s):
Atanu Kundu
◽
Arpan Dasgupta
◽
Rahul Das
◽
Shramana Chakraborty
◽
Arka Dutta
◽
...
Keyword(s):
Analytical Study
◽
Gate Stack
◽
Dg Mosfet
◽
Rf Performance
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Comparative study of RF performance of DDR IMPATTs based on group IV–IV materials at W-band
2016 Asia-Pacific Microwave Conference (APMC)
◽
10.1109/apmc.2016.7931316
◽
2016
◽
Author(s):
Sangeeta Jana Mukhopadhyay
◽
Suranjana Banerjee
◽
J.P. Banerjee
◽
Monojit Mitra
Keyword(s):
Comparative Study
◽
Group Iv
◽
W Band
◽
Rf Performance
Download Full-text
Surface Potential Modeling of Graded-Channel Gate-Stack (GCGS) High-K Dielectric Dual-Material Double-Gate (DMDG) MOSFET and Analog/RF Performance Study
Silicon
◽
10.1007/s12633-018-9826-z
◽
2018
◽
Vol 10
(6)
◽
pp. 2865-2875
◽
Cited By ~ 16
Author(s):
Vadthiya Narendar
◽
Kalola Ankit Girdhardas
Keyword(s):
Surface Potential
◽
Double Gate
◽
Performance Study
◽
Gate Stack
◽
High K
◽
Channel Gate
◽
High K Dielectric
◽
Rf Performance
◽
Dual Material
Download Full-text
Drain Current Modelling of Asymmetric Junctionless Dual Material Double Gate MOSFET with High K Gate Stack for Analog and RF Performance
Silicon
◽
10.1007/s12633-020-00783-w
◽
2020
◽
Author(s):
Arighna Basak
◽
Angsuman Sarkar
Keyword(s):
Drain Current
◽
Double Gate
◽
Gate Stack
◽
High K
◽
Double Gate Mosfet
◽
Rf Performance
◽
Dual Material
◽
Current Modelling
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Interfacial layer dependence of High-K gate stack based Conventional trigate FinFET concerning analog/RF performance
2018 4th International Conference on Devices, Circuits and Systems (ICDCS)
◽
10.1109/icdcsyst.2018.8605172
◽
2018
◽
Cited By ~ 1
Author(s):
Shubham Tayal
◽
Ashutosh Nandi
Keyword(s):
Interfacial Layer
◽
Gate Stack
◽
High K
◽
Rf Performance
Download Full-text
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