Edge Computing-based Defect Identification Model of Power IoT Edge Side Devices

Author(s):  
Dawei Li ◽  
Gengtao Jia ◽  
Chunhe Song ◽  
Shimao Yu
2019 ◽  
Vol 24 (2) ◽  
pp. 1045-1061 ◽  
Author(s):  
Yuwei Zhang ◽  
Ying Xing ◽  
Yunzhan Gong ◽  
Dahai Jin ◽  
Honghui Li ◽  
...  

2020 ◽  
Vol 140 (9) ◽  
pp. 1030-1039
Author(s):  
W.A. Shanaka P. Abeysiriwardhana ◽  
Janaka L. Wijekoon ◽  
Hiroaki Nishi

Author(s):  
Ping ZHAO ◽  
Jiawei TAO ◽  
Abdul RAUF ◽  
Fengde JIA ◽  
Longting XU

Author(s):  
Adyson Magalhaes Maia ◽  
Yacine Ghamri-Doudane ◽  
Dario Vieira ◽  
Miguel Franklin de Castro

Author(s):  
Wing Chiu Tam ◽  
Osei Poku ◽  
R. D. (Shawn) Blanton

Abstract Systematic defects due to design-process interactions are a dominant component of integrated circuit (IC) yield loss in nano-scaled technologies. Test structures do not adequately represent the product in terms of feature diversity and feature volume, and therefore are unable to identify all the systematic defects that affect the product. This paper describes a method that uses diagnosis to identify layout features that do not yield as expected. Specifically, clustering techniques are applied to layout snippets of diagnosis-implicated regions from (ideally) a statistically-significant number of IC failures for identifying feature commonalties. Experiments involving an industrial chip demonstrate the identification of possible systematic yield loss due to lithographic hotspots.


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