Investigations of stress sensitivity of 0.12 CMOS technology using process modeling

2002 ◽  
Author(s):  
V. Senez ◽  
T. Hoffmann ◽  
E. Robilliart ◽  
G. Bouche ◽  
H. Jaouen ◽  
...  
Keyword(s):  
Process Modeling ◽  
Cmos Technology ◽  
Stress Sensitivity

CMOS TECHNOLOGY FOR CCD VIDEO MEMORIES

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-41-C4-44
Author(s):  
G. J.T. DAVIDS ◽  
P. B. HARTOG ◽  
J. W. SLOTBOOM ◽  
G. STREUTKER ◽  
A. G. van der SIJDE ◽  
...  
Keyword(s):  
Cmos Technology

CMOS-TECHNOLOGY - STATUS, TRENDS AND APPLICATIONS

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-13-C4-22
Author(s):  
F. NEPPL ◽  
H.-J. PFLEIDERER
Keyword(s):  
Cmos Technology

CMOS TECHNOLOGY USING PLASMA NITRIDED OXIDE AS A GATE DIELECTRIC

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-421-C4-424 ◽  
Author(s):  
A. STRABONI ◽  
M. BERENGUER ◽  
B. VUILLERMOZ ◽  
P. DEBENEST ◽  
A. VERNA ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Cmos Technology

Study on Stress Sensitivity of Longmaxi Formation Shales in East Sichuan

2017 ◽  
Vol 4 (1) ◽  
pp. 7-13
Author(s):  
Guan Fujia ◽  
◽  
Wang Haitao ◽  
Jiang Yuling ◽  
Hu Haiyan
Keyword(s):  
Stress Sensitivity ◽  
Longmaxi Formation
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