Negative-ion production of reactive elements from compound gases in the RF plasma-sputter-type heavy negative-ion source

2002 ◽  
Author(s):  
H. Tsuji ◽  
J. Ishikawa ◽  
T. Tomita ◽  
Y. Gotoh
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Reactive Elements ◽  
Ion Production

scholarly journals Negative-Ion Production of Gas Material in RF-Plasma Sputter-Type Heavy Negative-Ion Source.

Shinku ◽  
1995 ◽  
Vol 38 (3) ◽  
pp. 218-220
Author(s):  
Hiroshi TSUJI ◽  
Yoshio OKAYAMA ◽  
Yoshitaka TOYOTA ◽  
Yasuhito GOTOH ◽  
Junzo ISHIKAWA
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Production

Negative‐ion production probability in rf plasma sputter‐type heavy negative‐ion source (abstract)a)

1994 ◽  
Vol 65 (4) ◽  
pp. 1226-1226
Author(s):  
Hiroshi Tsuji ◽  
Junzo Ishikawa ◽  
Yasuyuki Kawabata ◽  
Yasuhito Gotoh
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Production ◽  
Production Probability

Negative-Ion Implantation

1994 ◽  
Vol 354 ◽  
Author(s):  
Junzo Ishikawa
Keyword(s):  
Ion Implantation ◽  
Negative Ions ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma ◽  
Ion Currents ◽  
Promising Technique ◽  
Surface Charging ◽  
Silicon Carbon ◽  
A Charge

AbstractNegative-ion implantation is a promising technique for forthcoming ULSI (more than 256 M bits) fabrication and TFT (for color LCD) fabrication, since the surface charging voltage of insulated electrodes or insulators implanted by negative ions is found to saturate within so few as several volts, no breakdown of insulators would be expected without a charge neutralizer in these fabrication processes. Scatter-less negative-ion implantation into powders is also possible. For this purpose an rf-plasma-sputter type heavy negative-ion source was developed, which can deliver several milliamperes of various kinds of negative ion currents such as boron, phosphor, silicon, carbon, copper, oxygen, etc. A medium current negative-ion implanter with a small version of this type of ion source has been developed.

Monte Carlo simulation of negative ion production in the negative hydrogen ion source

2000 ◽  
Vol 71 (2) ◽  
pp. 883-886 ◽  
Author(s):  
M. Uematsu ◽  
T. Morishita ◽  
A. Hatayama ◽  
T. Sakurabayashi ◽  
M. Ogasawara
Keyword(s):  
Monte Carlo Simulation ◽  
Monte Carlo ◽  
Ion Source ◽  
Hydrogen Ion ◽  
Negative Ion ◽  
Ion Production ◽  
Negative Hydrogen Ion

scholarly journals A high-intensity, RF plasma-sputter negative ion source

1999 ◽  
Author(s):  
G. D. Alton ◽  
R. Lohwasser ◽  
B. Cui ◽  
Y. Bao ◽  
T. Zhang ◽  
...  
Keyword(s):  
High Intensity ◽  
Ion Source ◽  
Negative Ion ◽  
Rf Plasma

Molecular and negative ion production by a standard electron cyclotron resonance ion source

2012 ◽  
Vol 83 (2) ◽  
pp. 02A313 ◽  
Author(s):  
R. Rácz ◽  
S. Biri ◽  
Z. Juhász ◽  
B. Sulik ◽  
J. Pálinkás
Keyword(s):  
Cyclotron Resonance ◽  
Electron Cyclotron Resonance ◽  
Ion Source ◽  
Electron Cyclotron ◽  
Negative Ion ◽  
Ion Production

Recent results on negative ion production and extraction from the Culham Ion Source Test Stand

1990 ◽  
Vol 61 (1) ◽  
pp. 412-414 ◽  
Author(s):  
R. McAdams ◽  
R. F. King ◽  
A. F. Newman ◽  
A. J. T. Holmes
Keyword(s):  
Ion Source ◽  
Test Stand ◽  
Negative Ion ◽  
Ion Production ◽  
Source Test

Achievement of stable negative ion production with Cs-seeded for long pulse beam operation in the prototype of Cs-seeded negative ion source for JT-60SA

2020 ◽  
Vol 91 (2) ◽  
pp. 023502
Author(s):  
Masahiro Ichikawa ◽  
Atsushi Kojima ◽  
Junichi Hiratsuka ◽  
Masafumi Yoshida ◽  
Naotaka Umeda ◽  
...  
Keyword(s):  
Ion Source ◽  
Negative Ion ◽  
Pulse Beam ◽  
Ion Production ◽  
Long Pulse
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