Fabrication of three-dimensional HSQ resist structure using electron beam lithography

Abstract Methods for fabricating micro- and nanoscale three-dimensional (3D) structures such as electron-beam lithography (EBL) attracted attention in various fields. In EBL, an acceleration-voltage modulation method can be used to control the developing depth of the structure. In this study, we fabricated a rose petal structure using acceleration-voltage modulation. Using a rose petal mold, plastic- and silver-duplicated rose petals were prepared using nano-imprint lithography (NIL). We demonstrated that various complex 3D structures and materials can be duplicated using NIL by applying an acceleration-voltage modulation method.

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Three-Dimensional Proximity Effect Correction for Multilayer Structures in Electron Beam Lithography

Japanese Journal of Applied Physics ◽

10.1143/jjap.43.3762 ◽

2004 ◽

Vol 43 (6B) ◽

pp. 3762-3766 ◽

Cited By ~ 7

Author(s):

Kozo Ogino ◽

Hiromi Hoshino ◽

Yasuhide Machida ◽

Morimi Osawa ◽

Hiroshi Arimoto ◽

...

Keyword(s):

Electron Beam ◽

Proximity Effect ◽

Electron Beam Lithography ◽

Three Dimensional ◽

Multilayer Structures ◽

Proximity Effect Correction

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Fabrication of a three-dimensional optical vortices phase mask for astronomy by means of electron-beam lithography

Microelectronic Engineering ◽

10.1016/j.mee.2008.11.007 ◽

2009 ◽

Vol 86 (4-6) ◽

pp. 1103-1106 ◽

Cited By ~ 8

Author(s):

M. Prasciolu ◽

F. Tamburini ◽

G. Anzolin ◽

E. Mari ◽

M. Melli ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Three Dimensional ◽

Phase Mask ◽

Optical Vortices

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Evaluation of the dry resist octavinylsilsesquioxan and its application to three-dimensional electron-beam lithography

10.1117/12.241856 ◽

1996 ◽

Author(s):

Hans W. P. Koops ◽

Sergey V. Babin ◽

Mark A. Weber ◽

G. Dahm ◽

A. Holopkin ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Three Dimensional ◽

Dimensional Electron

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Three-dimensional diffractive micro- and nano-optical elements fabricated by electron-beam lithography

10.1117/12.700999 ◽

2007 ◽

Cited By ~ 2

Author(s):

Ivan B. Divliansky ◽

Eric G. Johnson

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Three Dimensional ◽

Optical Elements

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Three-Dimensional Electron Energy Deposition Modeling of Cathodoluminescence Emission near Threading Dislocations in GaN and Electron-Beam Lithography Exposure Parameters for a PMMA Resist

Microscopy and Microanalysis ◽

10.1017/s1431927612013414 ◽

2012 ◽

Vol 18 (6) ◽

pp. 1220-1228 ◽

Cited By ~ 17

Author(s):

Hendrix Demers ◽

Nicolas Poirier-Demers ◽

Matthew R. Phillips ◽

Niels de Jonge ◽

Dominique Drouin

Keyword(s):

Electron Beam ◽

Electron Energy ◽

Electron Beam Lithography ◽

Energy Deposition ◽

Signal To Noise Ratio ◽

Three Dimensional ◽

Incident Electron ◽

Incident Electron Energy ◽

Threading Dislocations ◽

Deposited Energy

AbstractThe Monte Carlo software CASINO has been expanded with new modules for the simulation of complex beam scanning patterns, for the simulation of cathodoluminescence (CL), and for the calculation of electron energy deposition in subregions of a three-dimensional (3D) volume. Two examples are presented of the application of these new capabilities of CASINO. First, the CL emission near threading dislocations in gallium nitride (GaN) was modeled. The CL emission simulation of threading dislocations in GaN demonstrated that a better signal-to-noise ratio was obtained with lower incident electron energy than with higher energy. Second, the capability to simulate the distribution of the deposited energy in 3D was used to determine exposure parameters for polymethylmethacrylate resist using electron-beam lithography (EBL). The energy deposition dose in the resist was compared for two different multibeam EBL schemes by changing the incident electron energy.

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