Optical Antenna NanoLED Based Interconnect Design

Author(s):  
Nicolas M. Andrade ◽  
Krishna T. Settaluri ◽  
Seth Fortuna ◽  
Sean Hooten ◽  
Kevin Han Eli Yablonovitch ◽  
...  
PIERS Online ◽  
2007 ◽  
Vol 3 (7) ◽  
pp. 1136-1138
Author(s):  
Yi Cao ◽  
Qijun Zhang ◽  
Ihsan Erdin

Micromachines ◽  
2021 ◽  
Vol 12 (2) ◽  
pp. 169
Author(s):  
Mengcheng Wang ◽  
Shenglin Ma ◽  
Yufeng Jin ◽  
Wei Wang ◽  
Jing Chen ◽  
...  

Through Silicon Via (TSV) technology is capable meeting effective, compact, high density, high integration, and high-performance requirements. In high-frequency applications, with the rapid development of 5G and millimeter-wave radar, the TSV interposer will become a competitive choice for radio frequency system-in-package (RF SIP) substrates. This paper presents a redundant TSV interconnect design for high resistivity Si interposers for millimeter-wave applications. To verify its feasibility, a set of test structures capable of working at millimeter waves are designed, which are composed of three pieces of CPW (coplanar waveguide) lines connected by single TSV, dual redundant TSV, and quad redundant TSV interconnects. First, HFSS software is used for modeling and simulation, then, a modified equivalent circuit model is established to analysis the effect of the redundant TSVs on the high-frequency transmission performance to solidify the HFSS based simulation. At the same time, a failure simulation was carried out and results prove that redundant TSV can still work normally at 44 GHz frequency when failure occurs. Using the developed TSV process, the sample is then fabricated and tested. Using L-2L de-embedding method to extract S-parameters of the TSV interconnection. The insertion loss of dual and quad redundant TSVs are 0.19 dB and 0.46 dB at 40 GHz, respectively.


2016 ◽  
Vol 2 (10) ◽  
pp. e1601006 ◽  
Author(s):  
Eric A. Muller ◽  
Benjamin Pollard ◽  
Hans A. Bechtel ◽  
Peter van Blerkom ◽  
Markus B. Raschke

Molecular solids and polymers can form low-symmetry crystal structures that exhibit anisotropic electron and ion mobility in engineered devices or biological systems. The distribution of molecular orientation and disorder then controls the macroscopic material response, yet it is difficult to image with conventional techniques on the nanoscale. We demonstrated a new form of optical nanocrystallography that combines scattering-type scanning near-field optical microscopy with both optical antenna and tip-selective infrared vibrational spectroscopy. From the symmetry-selective probing of molecular bond orientation with nanometer spatial resolution, we determined crystalline phases and orientation in aggregates and films of the organic electronic material perylenetetracarboxylic dianhydride. Mapping disorder within and between individual nanoscale domains, the correlative hybrid imaging of nanoscale heterogeneity provides insight into defect formation and propagation during growth in functional molecular solids.


Optik ◽  
2012 ◽  
Vol 123 (3) ◽  
pp. 268-271 ◽  
Author(s):  
Zihao Chen ◽  
Huajun Yang ◽  
Xinyang Wang ◽  
Jing Wang ◽  
Xiaoping Huang

2012 ◽  
Vol 18 (6) ◽  
pp. 1564-1570 ◽  
Author(s):  
Katsuyoshi Ikeda ◽  
Kohei Uosaki

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