Failure Analysis and Reliability Improvement of the Corner Region of Variation Lateral Doping Termination

Author(s):  
Min Ren ◽  
Xuefan Zhang ◽  
Xin Zhang ◽  
Junwei Feng ◽  
Yahan Yang ◽  
...  
Author(s):  
Michael Hertl ◽  
Diane Weidmann ◽  
Alex Ngai

Abstract A new approach to reliability improvement and failure analysis on ICs is introduced, involving a specifically developed tool for Topography and Deformation Measurement (TDM) under thermal stress conditions. Applications are presented including delamination risk or bad solderability assessment on BGAs during JEDEC type reflow cycles.


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