Performance effects of two nitrogen incorporation techniques on TaN/HfO/sub 2/ and poly/HfO/sub 2/ MOSCAP and MOSFET devices

Author(s):  
R. Nieh ◽  
K. Onishi ◽  
Rino Choi ◽  
Hag-Ju Cho ◽  
Chang Seok Kang ◽  
...  
Author(s):  
Raymond F. Genovese ◽  
◽  
Sara J. Shippee ◽  
Jessica Bonnell ◽  
Bernard J. Benton ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document