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Damage control with cluster ion implantation
2013 13th International Workshop on Junction Technology (IWJT)
◽
10.1109/iwjt.2013.6644497
◽
2013
◽
Author(s):
Shigeki Sakai
◽
Nariaki Hamamoto
◽
Yoshiki Nakashima
◽
Hiroshi Onoda
Keyword(s):
Ion Implantation
◽
Damage Control
◽
Cluster Ion
Download Full-text
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Low Temperature Graphene Film Formation with Ethane Cluster Ion Implantation
2016 21st International Conference on Ion Implantation Technology (IIT)
◽
10.1109/iit.2016.7882889
◽
2016
◽
Author(s):
Noriaki Toyoda
◽
Isao Yamada
Keyword(s):
Low Temperature
◽
Ion Implantation
◽
Film Formation
◽
Graphene Film
◽
Cluster Ion
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Cluster Ion Implantation for Process Application -Carbon Cluster co-Implantation-
10.1063/1.3548322
◽
2011
◽
Cited By ~ 1
Author(s):
M. Tanjyo
◽
T. Nagayama
◽
H. Onoda
◽
N. Hamamoto
◽
S. Umisedo
◽
...
Keyword(s):
Ion Implantation
◽
Carbon Cluster
◽
Cluster Ion
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Defect characteristics by boron cluster ion implantation
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
◽
10.1016/s0168-583x(03)00878-4
◽
2003
◽
Vol 206
◽
pp. 855-860
◽
Cited By ~ 14
Author(s):
Takaaki Aoki
◽
Jiro Matsuo
◽
Gikan Takaoka
◽
Noriaki Toyoda
◽
Isao Yamada
Keyword(s):
Ion Implantation
◽
Boron Cluster
◽
Cluster Ion
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Parasitic resistance and leakage reduction by raised source / drain extention fabricated with cluster ion implantation and millisecond annealing
2008 16th IEEE International Conference on Advanced Thermal Processing of Semiconductors
◽
10.1109/rtp.2008.4690561
◽
2008
◽
Cited By ~ 1
Author(s):
Koichi Yako
◽
Toyoji Yamamoto
◽
Kazuya Uejima
◽
Takeo Ikezawa
◽
Masami Hane
Keyword(s):
Ion Implantation
◽
Leakage Reduction
◽
Parasitic Resistance
◽
Cluster Ion
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Molecular dynamics simulations of cluster ion implantation for shallow junction formation
10.1063/1.1395465
◽
2001
◽
Cited By ~ 1
Author(s):
Takaaki Aoki
Keyword(s):
Molecular Dynamics
◽
Ion Implantation
◽
Molecular Dynamics Simulations
◽
Shallow Junction
◽
Junction Formation
◽
Cluster Ion
◽
Dynamics Simulations
Download Full-text
Shallow junction formation by polyatomic cluster ion implantation
Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
◽
10.1016/s0168-583x(96)00451-x
◽
1997
◽
Vol 121
(1-4)
◽
pp. 345-348
◽
Cited By ~ 36
Author(s):
D. Takeuchi
◽
N. Shimada
◽
J. Matsuo
◽
I. Yamada
Keyword(s):
Ion Implantation
◽
Shallow Junction
◽
Junction Formation
◽
Cluster Ion
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Vacancy-Type Defects Introduced by Gas Cluster Ion-Implantation on Si Studied by Monoenergetic Positron Beams
Japanese Journal of Applied Physics
◽
10.7567/jjap.51.111801
◽
2012
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Vol 51
(11R)
◽
pp. 111801
◽
Cited By ~ 3
Author(s):
Akira Uedono
◽
Tsuyoshi Moriya
◽
Takuro Tsutsui
◽
Shogo Kimura
◽
Nagayasu Oshima
◽
...
Keyword(s):
Ion Implantation
◽
Cluster Ion
◽
Positron Beams
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Cluster Ion Implantation - Prospects and Challenges-
2007 International Workshop on Junction Technology
◽
10.1109/iwjt.2007.4279945
◽
2007
◽
Author(s):
Jiro Matsuo
◽
Takaaki Aoki
◽
Toshio Seki
Keyword(s):
Ion Implantation
◽
Cluster Ion
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Applications of cluster ion implantation in microelectronics devices
10.1063/1.59254
◽
1999
◽
Author(s):
Isao Yamada
◽
Jiro Matsuo
◽
Noriaki Toyoda
◽
Takaaki Aoki
Keyword(s):
Ion Implantation
◽
Cluster Ion
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Study of damage formation by low-energy boron cluster ion implantation
Ion Implantation Technology. 2002. Proceedings of the 14th International Conference on
◽
10.1109/iit.2002.1258066
◽
2002
◽
Cited By ~ 1
Author(s):
T. Aoki
◽
J. Matsuo
◽
G. Takaoka
Keyword(s):
Ion Implantation
◽
Low Energy
◽
Boron Cluster
◽
Cluster Ion
Download Full-text
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