Low Temperature Graphene Film Formation with Ethane Cluster Ion Implantation

2016 ◽  
Author(s):  
Noriaki Toyoda ◽  
Isao Yamada
Keyword(s):  
Low Temperature ◽  
Ion Implantation ◽  
Film Formation ◽  
Graphene Film ◽  
Cluster Ion

High Quality Optical Film Formation with O2 Cluster Ion Assisted Deposition

2001 ◽  
Vol 697 ◽  
Author(s):  
Noriaki Toyoda ◽  
Kenichi Shirai ◽  
Mititaka Terasawa ◽  
Shinji Matsui ◽  
Isao Yamada
Keyword(s):  
Low Temperature ◽  
Smooth Surface ◽  
Film Formation ◽  
Optical Filters ◽  
High Refractive Index ◽  
Bottom Surface ◽  
Wavelength Shift ◽  
High Quality ◽  
Cluster Ion ◽  
Significant Wavelength

AbstractHigh-quality Ta2O5/SiO2 were deposited with oxygen gas cluster ion assisted deposition at low-temperature for advanced optical filters. With gas cluster ion assisted deposition, high refractive index and very smooth surface of Ta2O5 films were realized. The optimum cluster ion energy and cluster ion current density for Ta2O5 films were found to be 7keV and 0.5μA/cm2, respectively. The structure of film was very uniform and no porous or columnar structures were observed. The surface or interfaces of Ta2O5/SiO2 films were also very flat by surface smoothing effect of cluster ion beams. Very smooth surface can be realized even though the bottom surface was rough. There was no significant wavelength shift after an environmental test, which indicates that dense oxide films were formed at low-temperature with O2 cluster ion assisted deposition.

Generation of O2 and metalorganic cluster ion beams and its application to low-temperature thin oxide film formation

1996 ◽  
Vol 217-218 ◽  
pp. 78-81 ◽  
Author(s):  
M. Akizuki ◽  
J. Matsuo ◽  
M. Harada ◽  
S. Ogasawara ◽  
A. Doi ◽  
...  
Keyword(s):  
Low Temperature ◽  
Oxide Film ◽  
Film Formation ◽  
Ion Beams ◽  
Thin Oxide Film ◽  
Cluster Ion Beams ◽  
Cluster Ion ◽  
Thin Oxide

Amorphous Fe-B alloys produced by ion implantation. II. Low-temperature radiation damage

1985 ◽  
Vol 15 (6) ◽  
pp. 1237-1247 ◽  
Author(s):  
A Audouard ◽  
A Benyagoub ◽  
L Thome ◽  
J Chaumont
Keyword(s):  
Low Temperature ◽  
Ion Implantation ◽  
Radiation Damage ◽  
Temperature Radiation

Damage control with cluster ion implantation

2013 ◽  
Author(s):  
Shigeki Sakai ◽  
Nariaki Hamamoto ◽  
Yoshiki Nakashima ◽  
Hiroshi Onoda
Keyword(s):  
Ion Implantation ◽  
Damage Control ◽  
Cluster Ion

Mössbauer study of iron hydride formation by low temperature ion implantation

1983 ◽  
Vol 46 (8) ◽  
pp. 647-650 ◽  
Author(s):  
F. Schreyer ◽  
G. Frech ◽  
G.K. Wolf ◽  
F.E. Wagner
Keyword(s):  
Low Temperature ◽  
Ion Implantation ◽  
Mössbauer Study ◽  
Hydride Formation ◽  
Iron Hydride

Stability of non-equilibrium nickel hydrides prepared by low-temperature ion implantation

1981 ◽  
Vol 68 (2) ◽  
pp. 619-627 ◽  
Author(s):  
L. Brossard ◽  
L. Thomé ◽  
A. Traverse ◽  
H. Bernas ◽  
J. Chaumont ◽  
...  
Keyword(s):  
Low Temperature ◽  
Ion Implantation ◽  
Nickel Hydrides ◽  
Non Equilibrium

Cluster Ion Implantation for Process Application -Carbon Cluster co-Implantation-

2011 ◽  
Author(s):  
M. Tanjyo ◽  
T. Nagayama ◽  
H. Onoda ◽  
N. Hamamoto ◽  
S. Umisedo ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Carbon Cluster ◽  
Cluster Ion
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