Criteria for Plasmon-Enhanced Electron Drag in Si Metal–Oxide–Semiconductor Devices
2015 ◽
Vol 36
(3)
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pp. 265-267
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Ming-Jer Chen
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Shang-Hsun Hsieh
◽
Yu-Chiao Liao
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Chuan-Li Chen
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Ming-Fu Tsai
Boris Laikhtman
◽
Paul M. Solomon
2009 ◽
Vol 27
(3)
◽
pp. 1261
Shu-Tong Chang
◽
Ming-Han Liao
◽
Chang-Chun Lee
◽
Jacky Huang
◽
Wei-Ching Wang
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...
2010 ◽
Vol 96
(24)
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pp. 242901
◽
Yi Zhao
◽
Koji Kita
◽
Akira Toriumi
2012 ◽
Vol 12
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pp. S10-S19
◽
Heiji Watanabe
◽
Katsuhiro Kutsuki
◽
Atsushi Kasuya
◽
Iori Hideshima
◽
Gaku Okamoto
◽
...
2011 ◽
Vol 32
(7)
◽
pp. 076001
◽
2010 ◽
Vol 242
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pp. 012010
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S Markov
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P Sushko
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C Fiegna
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E Sangiorgi
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A Shluger
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...
1982 ◽
Vol 93
(3-4)
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pp. 321-330
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Q.D. Mohd Khosru
◽
Md. Nasir Uddin
◽
M. Rezwan Khan
1993 ◽
Vol 74
(3)
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pp. 2125-2127
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1996 ◽
Vol 80
(3)
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pp. 1578-1582
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H. Kobayashi
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K. Namba
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Y. Yamashita
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Y. Nakato
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T. Komeda
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...