PMD Monitoring by Tracking the Chromatic-Dispersion-Insensitive RF Power of the Vestigial Sideband

2004 ◽  
Vol 16 (9) ◽  
pp. 2177-2179 ◽  
Author(s):  
T. Luo ◽  
Z. Pan ◽  
S.M.R.M. Nezam ◽  
L.S. Yan ◽  
A.B. Sahin ◽  
...  
Keyword(s):  
Chromatic Dispersion ◽  
Rf Power

scholarly journals Generation of Switchable Chirp Waveforms in the Photonic Domain with Immunity to Dispersion-Induced Power Fading

Photonics ◽  
2021 ◽  
Vol 8 (11) ◽  
pp. 501
Author(s):  
Chaoqun Huang ◽  
Jun Ou ◽  
Hao Chi
Keyword(s):  
Bias Voltage ◽  
Chromatic Dispersion ◽  
Radio Over Fiber ◽  
Rf Power ◽  
Optical Filtering ◽  
Polarization Control ◽  
Mach Zehnder Modulator ◽  
The Stability ◽  
Rf Signal ◽  
The Given

A novel photonic approach to generating switchable multi-format chirp waveforms using a dual-drive dual-parallel Mach–Zehnder modulator (DD-DPMZM) is proposed and experimentally demonstrated. By properly controlling the bias voltage on the DD-DPMZM, different chirp RF waveforms, including the dual-, down-, and up-chirp waveforms, can be obtained when an RF signal and a chirp RF signal are injected into the modulator. A main feature of this approach is that it can eliminate chromatic dispersion-induced RF power fading, which is highly desired in distributed multi-functional radars based on radio over fiber. There is no polarization control and optical filtering in the given scheme, which also improves the stability and feasibility of the approach. An experiment successfully demonstrated the generation and switching of the multi-format chirp waveforms and the capability of immunity to dispersion-induced power fading.

Chromatic Dispersion Monitoring for DPSK Systems Using RF Power Spectrum

2009 ◽  
Vol 27 (24) ◽  
pp. 5704-5709 ◽  
Author(s):  
Jian Zhao ◽  
A.P.T. Lau ◽  
K.K. Qureshi ◽  
Zhaohui Li ◽  
Chao Lu ◽  
...  
Keyword(s):  
Power Spectrum ◽  
Chromatic Dispersion ◽  
Rf Power

scholarly journals Irregular Shifting of RF Driving Signal Phase to Overcome Dispersion Power Fading

Photonics ◽  
2019 ◽  
Vol 6 (4) ◽  
pp. 104 ◽  
Author(s):  
Febrizal Ujang ◽  
Teguh Firmansyah ◽  
Purnomo S. Priambodo ◽  
Gunawan Wibisono
Keyword(s):  
Chromatic Dispersion ◽  
Modulation Scheme ◽  
Rf Power ◽  
Signal Phase ◽  
Optical Wavelength ◽  
Optical Single Sideband ◽  
Mach Zehnder Modulator ◽  
Bias Point ◽  
Driving Signal ◽  
Better Than

The main problem with the radio-over-fiber (RoF) link is the decrease in the recovered radio frequency (RF) power due to the chromatic dispersion of the fiber known as dispersion power fading. One of the methods for dealing with dispersion power fading is to use the optical single sideband (OSSB) modulation scheme. The OSSB modulation scheme can be generated by biasing the dual-drive Mach–Zehnder modulator (DD-MZM) to the quadrature bias point (QBP) and shifting the RF drive signal phase (θ) by 90°, which is called the regular θ. However, the OSSB modulation scheme only overcomes dispersion power fading well at the modulation index (m) < 0.2. This paper proposes an irregular θ method to overcome dispersion power fading at all m. There are two irregular θ for every m used. The irregular θ managed to handle dispersion power fading better than OSSB modulation scheme did at every m. Specifically, the irregular θ could handle the dispersion power fading well at m ≤ 1. In sum, the irregular θ could overcome the dispersion power fading at any RF frequency and optical wavelength without having to re-adjust the transmitter.

Chromatic dispersion monitoring of DPSK signals using RF power detection

2008 ◽  
Author(s):  
Jian Zhao ◽  
K. K. Qureshi ◽  
Zhao hui Li ◽  
Chao Lu ◽  
H. Y. Tam ◽  
...  
Keyword(s):  
Chromatic Dispersion ◽  
Rf Power

Investigation of ultra-thin films of YBa2Cu3O7−δ grown on MgO

1990 ◽  
Vol 48 (4) ◽  
pp. 6-7
Author(s):  
S.K. Streiffer ◽  
C.B. Eom ◽  
J.C. Bravman ◽  
T.H. Geballet
Keyword(s):  
Thin Films ◽  
Room Temperature ◽  
Deposition Process ◽  
Nucleation And Growth ◽  
Multilayer Structures ◽  
Rf Power ◽  
Oxygen Loss ◽  
Transmission Electron ◽  
Single Target ◽  
Mtorr Argon

The study of very thin (<15 nm) YBa2Cu3O7−δ (YBCO) films is necessary both for investigating the nucleation and growth of films of this material and for achieving a better understanding of multilayer structures incorporating such thin YBCO regions. We have used transmission electron microscopy to examine ultra-thin films grown on MgO substrates by single-target, off-axis magnetron sputtering; details of the deposition process have been reported elsewhere. Briefly, polished MgO substrates were attached to a block placed at 90° to the sputtering target and heated to 650 °C. The sputtering was performed in 10 mtorr oxygen and 40 mtorr argon with an rf power of 125 watts. After deposition, the chamber was vented to 500 torr oxygen and allowed to cool to room temperature. Because of YBCO’s susceptibility to environmental degradation and oxygen loss, the technique of Xi, et al. was followed and a protective overlayer of amorphous YBCO was deposited on the just-grown films.

Analysis of Sputtered Zinc Oxide Films

1980 ◽  
Vol 38 ◽  
pp. 416-417
Author(s):  
T. A. Emma ◽  
M. P. Singh
Keyword(s):  
Electron Microscopy ◽  
Zinc Oxide ◽  
Piezoelectric Materials ◽  
Oxide Films ◽  
Optical Quality ◽  
Zno Films ◽  
Rf Power ◽  
X Ray Diffraction ◽  
Sputtered Films ◽  
Zinc Oxide Films

Optical quality zinc oxide films have been characterized using reflection electron diffraction (RED), replication electron microscopy (REM), scanning electron microscopy (SEM), and X-ray diffraction (XRD). Significant microstructural differences were observed between rf sputtered films and planar magnetron rf sputtered films. Piezoelectric materials have been attractive for applications to integrated optics since they provide an active medium for signal processing. Among the desirable physical characteristics of sputtered ZnO films used for this and related applications are a highly preferred crystallographic texture and relatively smooth surfaces. It has been found that these characteristics are very sensitive to the type and condition of the substrate and to the several sputtering parameters: target, rf power, gas composition and substrate temperature.

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