A new deep reactive ion etching process by dual sidewall protection layer

Author(s):  
J. Ohara ◽  
K. Kano ◽  
Y. Takeuchi ◽  
N. Ohya ◽  
Y. Otsuka ◽  
...  
2006 ◽  
Vol 16 (12) ◽  
pp. 2570-2575 ◽  
Author(s):  
Yiyong Tan ◽  
Rongchun Zhou ◽  
Haixia Zhang ◽  
Guizhang Lu ◽  
Zhihong Li

2018 ◽  
Vol 2 (1) ◽  
pp. 1-4 ◽  
Author(s):  
Abdulrahman Alsolami ◽  
Adnan Zaman ◽  
Ivan Fernando Rivera ◽  
Masoud Baghelani ◽  
Jing Wang

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