A three-step model of black silicon formation in Deep Reactive Ion Etching process
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2006 ◽
Vol 16
(12)
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pp. 2570-2575
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2013 ◽
Vol 52
(10S)
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pp. 10MC04
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2018 ◽
Vol 269
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pp. 288-292
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2015 ◽
Vol 58
(2)
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pp. 381-389
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