A three-step model of black silicon formation in Deep Reactive Ion Etching process

Author(s):  
Fuyun Zhu ◽  
Chen Wang ◽  
Xiaosheng Zhang ◽  
Xin Zhao ◽  
Haixia Zhang
2006 ◽  
Vol 16 (12) ◽  
pp. 2570-2575 ◽  
Author(s):  
Yiyong Tan ◽  
Rongchun Zhou ◽  
Haixia Zhang ◽  
Guizhang Lu ◽  
Zhihong Li

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