Deep learning for virtual metrology: Modeling with optical emission spectroscopy data

2017 IEEE 3rd International Forum on Research and Technologies for Society and Industry (RTSI) ◽

10.1109/rtsi.2017.8065905 ◽

2017 ◽

Author(s):

Matteo Terzi ◽

Chiara Masiero ◽

Alessandro Beghi ◽

Marco Maggipinto ◽

Gian Antonio Susto

Keyword(s):

Deep Learning ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data ◽

Virtual Metrology

Download Full-text

In-situ virtual metrology for the silicon-dioxide etch rate by using optical emission spectroscopy data

Journal of the Korean Physical Society ◽

10.3938/jkps.65.168 ◽

2014 ◽

Vol 65 (2) ◽

pp. 168-175 ◽

Author(s):

Boomsoo Kim ◽

Sang Jeen Hong

Keyword(s):

Silicon Dioxide ◽

Emission Spectroscopy ◽

Etch Rate ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data ◽

Virtual Metrology

Download Full-text

Virtual metrology for TSV etch depth measurement using optical emission spectroscopy

2015 IEEE Electrical Design of Advanced Packaging and Systems Symposium (EDAPS) ◽

10.1109/edaps.2015.7383700 ◽

2015 ◽

Author(s):

Ja Myung Gu ◽

Sang Jeen Hong

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Depth Measurement ◽

Virtual Metrology

Download Full-text

Prediction of plasma etch process by using actinometry-based optical emission spectroscopy data and neural network

Journal of Materials Processing Technology ◽

10.1016/j.jmatprotec.2008.06.006 ◽

2009 ◽

Vol 209 (5) ◽

pp. 2620-2626 ◽

Author(s):

Byungwhan Kim ◽

Minji Kwon

Keyword(s):

Neural Network ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data ◽

Download Full-text

Statistical Analysis of Emission Intensity for Silicon Dioxide Etching Using Optical Emission Spectroscopy Data

Journal of the Korean Physical Society ◽

10.3938/jkps.55.1873 ◽

2009 ◽

Vol 55 (5(1)) ◽

pp. 1873-1876

Author(s):

Sang Jeen Hong ◽

Jin Su Park ◽

Dong Sun Seo ◽

Hyun Wook Kim

Keyword(s):

Statistical Analysis ◽

Silicon Dioxide ◽

Emission Intensity ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data

Download Full-text

Modeling and filtering of optical emission spectroscopy. Data for plasma etching systems

Proceedings of the 1997 American Control Conference (Cat. No.97CH36041) ◽

10.1109/acc.1997.611875 ◽

1997 ◽

Author(s):

S. Rangan ◽

C. Spanos ◽

K. Poolla

Keyword(s):

Plasma Etching ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data

Download Full-text

Neural network modeling of reactive ion etching using optical emission spectroscopy data

IEEE Transactions on Semiconductor Manufacturing ◽

10.1109/tsm.2003.818976 ◽

2003 ◽

Vol 16 (4) ◽

pp. 598-608 ◽

Author(s):

Sang Jeen Hong ◽

G.S. May ◽

Dong-Cheol Park

Keyword(s):

Neural Network ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Network Modeling ◽

Reactive Ion Etching ◽

Optical Emission ◽

Neural Network Modeling ◽

Spectroscopy Data ◽

Download Full-text

Analysis of optical emission spectroscopy data during silicon etching in SF6/O2/Ar plasma

Plasma Science and Technology ◽

10.1088/2058-6272/ac24f4 ◽

2021 ◽

Author(s):

Dong Hwan Kim ◽

Jeong Eun Choi ◽

Sang Jeen Hong

Keyword(s):

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Silicon Etching ◽

Spectroscopy Data ◽

Download Full-text

Calculation of the Precursor Flux from Optical Emission Spectroscopy Data in Plasma Enhanced Chemical Vapour Deposition of Silane and its Correlation with the Deposition Rate

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.3955 ◽

2002 ◽

Vol 41 (Part 1, No. 6A) ◽

pp. 3955-3960 ◽

Author(s):

Partha Pratim Ray ◽

Namita Dutta Gupta ◽

Partha Chaudhuri

Keyword(s):

Deposition Rate ◽

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Chemical Vapour ◽

Optical Emission ◽

Spectroscopy Data

Download Full-text

Modeling and filtering of optical emission spectroscopy data for plasma etching systems

1997 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat. No.97CH36023) ◽

10.1109/issm.1997.664507 ◽

2002 ◽

Author(s):

S. Rangan ◽

C. Spanos ◽

K. Poolla

Keyword(s):

Plasma Etching ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Optical Emission ◽

Spectroscopy Data

Download Full-text

Neural network based time series modeling of optical emission spectroscopy data for fault detection in reactive ion etching

10.1117/12.485230 ◽

2003 ◽

Author(s):

Sang Jeen Hong ◽

Gary S. May

Keyword(s):

Neural Network ◽

Time Series ◽

Fault Detection ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Reactive Ion Etching ◽

Optical Emission ◽

Time Series Modeling ◽

Spectroscopy Data ◽

Download Full-text