$\hbox{In}_{0.5}\hbox{Ga}_{0.5}\hbox{As}$-Based Metal–Oxide–Semiconductor Capacitor on GaAs Substrate Using Metal–Organic Chemical Vapor Deposition
2013 ◽
Vol 60
(1)
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pp. 235-240
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2000 ◽
Vol 7
(1)
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pp. 12
2021 ◽
Vol 15
(6)
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pp. 2170024