Temperature Control for Nano-Scale Films by Spatially-Separated Atomic Layer Deposition Based on Generalized Predictive Control

2015 ◽  
Vol 14 (6) ◽  
pp. 1094-1103 ◽  
Author(s):  
Wen-Jie He ◽  
Hai-Tao Zhang ◽  
Zhiyong Chen ◽  
Ji-Long Lin ◽  
Kan Tian ◽  
...  
2015 ◽  
Vol 23 (6) ◽  
pp. 2408-2415 ◽  
Author(s):  
Wen-Jie He ◽  
Hai-Tao Zhang ◽  
Zhiyong Chen ◽  
Bo Chu ◽  
Kun Cao ◽  
...  

2015 ◽  
Vol 114 ◽  
pp. 90-93 ◽  
Author(s):  
Choong-Ki Kim ◽  
Hyun Jun Ahn ◽  
Jung Min Moon ◽  
Sukwon Lee ◽  
Dong-II Moon ◽  
...  

2016 ◽  
Vol 4 (28) ◽  
pp. 6864-6872 ◽  
Author(s):  
K. D. Kim ◽  
M. H. Park ◽  
H. J. Kim ◽  
Y. J. Kim ◽  
T. Moon ◽  
...  

The evolution of ferroelectricity in undoped-HfO2 thin films is systematically studied by controlling the deposition temperature during atomic layer deposition.


2021 ◽  
Author(s):  
Lei Yu ◽  
Wen-Gang Cui ◽  
Qiang Zhang ◽  
Zhuo-Fei Li ◽  
Yan Shen ◽  
...  

AIM-X catalysts were successfully obtained by depositing MoS2 within NU-1000 through ALD. The conversion rate of the obtained AIM-60 is much better than that of the traditional MoS2/γ-Al2O3, and it can directly convert dibenzothiophene to biphenyl.


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